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Deposition Process and Property of Silica Films Containing Organic Groups from Aqueous Solution of Alkoxides

Published online by Cambridge University Press:  31 January 2011

Junrok Oh ,
Hiroaki Imai ,
Hiroshi Hirashima  and
Koji Tsukuma
Junrok Oh
Affiliation:
Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Kohoku Yokahama 223, Japan
Hiroaki Imai*
Affiliation:
Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Kohoku Yokahama 223, Japan
Hiroshi Hirashima
Affiliation:
Department of Applied Chemistry, Faculty of Science and Technology, Keio University, 3–14–1 Hiyoshi, Kohoku Yokahama 223, Japan
Koji Tsukuma
Affiliation:
Tsukuba Research Laboratory, Tosoh Corporation, 43, Miyukigaoka, Tsukuba 305, Japan
*
a)Author to whom correspondence should be addressed.
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Abstract

Silica thin films containing organic groups were directly deposited from aqueous solutions of silicon alkoxides. Effects of functional groups of the alkoxides and the deposition conditions on the preparation of the films were investigated in order to clarify the deposition process. Silica films containing methyl and phenyl groups were deposited from aqueous solutions of methyl- and phenyltrialkoxysilanes, respectively, in the pH region lower than 3 or higher than 6. The composition and the property of the deposited films were influenced by pH and the temperature of the solutions and the starting materials. The adhesion of the deposited films on hydrophobic substrates was lower than that on hydrophilic ones, although the films were formed on both surfaces. The refractive index of the methyl-containing films, ca. 1.44, decreased with removal of methyl groups by heating up to 500 °C.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 4 , April 1997 , pp. 1008 - 1016
Copyright
Copyright © Materials Research Society 1997

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