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Deposition of mullite and mullite-like coatings on silicon carbide by dual-source metal plasma immersion

Published online by Cambridge University Press:  31 January 2011

Othon R. Monteiro ,
Zhi Wang  and
Ian G. Brown
Othon R. Monteiro
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720
Zhi Wang
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720
Ian G. Brown
Affiliation:
Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720
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Abstract

Mullite and mullite-like coatings on silicon carbide have been produced by a metal plasma immersion ion implantation and deposition (Mepiiid) technique based on two cathodic vacuum arc sources and concurrent pulse biasing of the substrate in an oxygen atmosphere. The deposition was carried out at oxygen partial pressures of between 0.66 and 3.33 Pa. The Al : Si ratio in the films varied from 1 : 1 to 8 : 1 and was controlled by varying the pulse duration of the separate plasma guns. High bias voltage was used early in the deposition process in order to produce atomic mixing at the film-substrate interface, while lower bias voltage was used later in the deposition; low ion energy allows control of the physical properties of the film as well as faster deposition rates. The as-deposited films were amorphous, and crystalline mullite was formed by subsequent annealing at 1100 °C for 2 h in air. Strong adhesion between the mullite and the SiC was achieved, in some cases exceeding the 70 MPa instrumental limit of our pull-tester.

Type
Articles
Information
Journal of Materials Research , Volume 12 , Issue 9 , September 1997 , pp. 2401 - 2410
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Donkai, N., Miyamoto, T., Kobuto, T., and Tanei, H., J. Mater. Sci. 27, 6193 (1992).CrossRefGoogle Scholar
2.Lee, K. N., Miller, R. A., and Jacobson, N. S., J. Am. Ceram. Soc. 78, 705 (1995).CrossRefGoogle Scholar
3.Hildmann, B. O., Schneider, H., and Schmucker, M., J. European Ceram. Soc. 16, 287 (1996).CrossRefGoogle Scholar
4.Courtright, E. L., Surf. Coatings Technol. 68/69, 116 (1994).CrossRefGoogle Scholar
5.Mulpuri, R. P. and Sarin, V. K., in Mullite Coatings for Corrosion Protection of Silicon Carbide (Oak Ridge, TN, 1995).Google Scholar
6.Mulpuri, R. P. and Sarin, V. K., J. Mater. Res. 11, 1315–1324 (1996).CrossRefGoogle Scholar
7.Monteiro, O. R., Wang, Z., Yu, K-M., Hou, P.Y., Brown, I. G., Rabin, B. H., and Kessinger, G. F., in Plasma Deposition of High Temperature Protective Coatings (Oak Ridge, TN, 1996).Google Scholar
8.Lafferty, J. M., Vacuum Arcs–Theory and Applications (Wiley, New York, 1980).Google Scholar
9.Boxman, R. L., Martin, P., and Sanders, D., Vacuum Arc Science and Technology (Noyes, New York, 1995).Google Scholar
10.Daalder, J. E., Physica 104C, 91 (1981).Google Scholar
11.Tuma, D. T., Chen, C. L., and Davies, D. K., J. Appl. Phys. 49, 3821 (1978).CrossRefGoogle Scholar
12.Aksenov, I. I., Belokhvostikov, A. N., Padalka, V. G., Repalov, N. S., and Khoroshikh, V. M., Plasma Physics and Controlled Fusion 28, 761 (1986).CrossRefGoogle Scholar
13.Anders, A., Anders, S., and Brown, I. G., Plasma Sources Sci. Technol. 4, 1 (1995).Google Scholar
14.Brown, I. G. and Godechot, X., IEEE Trans. Plasma Sci. PS-19, 713 (1991).CrossRefGoogle Scholar
15.Brown, I. G., Rev. Sci. Instrum. 10, 3061 (1994).CrossRefGoogle Scholar
16.Aksay, I. A. and Pask, J. A., J. Am. Ceram. Soc. 58, 507 (1975).CrossRefGoogle Scholar
17.Epicier, T., O'Keefe, M. A., and Thomas, G., Acta Crystallogr. A46, 948 (1990).CrossRefGoogle Scholar
18.Fisher, R. X., Schneider, H., and Voll, D., J. European Ceram. Soc. 16, 109 (1996).CrossRefGoogle Scholar
19.Rahman, S. H., Strohenk, S., Paulmann, C., and Feustel, U., J. European Ceram. Soc. 16, 177 (1996).CrossRefGoogle Scholar
20.ASM Handbook: Alloy Phase Diagrams; Vol. 3, edited by H., Baker (ASM INTERNATIONAL, Materials Park, OH, 1994).Google Scholar
21.Ban, T. and Okada, K., J. Am. Ceram. Soc. 75, 227 (1992).CrossRefGoogle Scholar
22.Ibn-Charaa, M., Jaouen, M., Delafond, J., and Pranevicius, L., Diamond and Related Materials 5, 128 (1996).CrossRefGoogle Scholar