Hostname: page-component-586b7cd67f-g8jcs Total loading time: 0 Render date: 2024-11-26T18:16:03.050Z Has data issue: false hasContentIssue false
  • English
  • Français

Continuous microindentation of passivating surfaces

Published online by Cambridge University Press:  31 January 2011

Shankar K. Venkataraman ,
David L. Kohlstedt  and
William W. Gerberich
Shankar K. Venkataraman
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455–0132
David L. Kohlstedt
Affiliation:
Department of Geology and Geophysics, University of Minnesota, Minneapolis, Minnesota 55455
William W. Gerberich
Affiliation:
Department of Chemical Engineering and Materials Science, University of Minnesota, Minneapolis, Minnesota 55455–0132
Get access

Abstract

Continuous microindentation tests performed on the electropolished surfaces of single crystal Fe (3 wt.% Si), known to have a thin passivation film, show a sharp discontinuity at a load of 1.8 mN. To this point, there was no apparent plastic deformation in the metal in that the loading and unloading curves exactly overlay each other. Stresses at the discontinuity were close to the theoretical strength of the metal. Elastic contact theories of Hertz and Love reproduced the elastic portion of the load-displacement curves. On removing the passivation film with a HCl solution, indentation tests yielded strengths nearly two orders of magnitude smaller. The strength recovered to near its initial value after the liquid evaporated and the passivation film re-formed.

Type
Communications
Information
Journal of Materials Research , Volume 8 , Issue 4 , April 1993 , pp. 685 - 688
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Pethica, J.B. and Tabor, D., Surf. Sci. 89, 182 (1979).CrossRefGoogle Scholar
2Oliver, W.C. and Pharr, G. M., J. Mater. Res. 7, 1564 (1992).CrossRefGoogle Scholar
3Doerner, M.F. and Nix, W.D., J. Mater. Res. 1, 601 (1986).Google Scholar
4Wu, T. W., Hwang, C., Lo, J., and Alexopoulos, P. S., Thin Solid Films 166, 299 (1988).CrossRefGoogle Scholar
5Zielinski, W., Huang, H., and Gerberich, W. W., unpublished research.Google Scholar
6Harvey, S., Huang, H., and Venkataraman, S., and Gerberich, W. W., unpublished research.Google Scholar
7Timoshenko and Goodier, , Theory of Elasticity, 2nd ed. (McGraw-Hill, New York, 1951), p. 93.Google Scholar
8Venkataraman, S., White, R., and Gerberich, W. W., unpublished results.Google Scholar
9Johnson, K. L., Contact Mechanics (Cambridge University Press, Cambridge, 1985), pp. 90–93, 111-114.CrossRefGoogle Scholar
10Venkataraman, S., Kohlstedt, D.L., and Gerberich, W. W., unpublished results.Google Scholar