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Bonding behavior of Cu/CuO thick film on a low-firing ceramic substrate

Published online by Cambridge University Press:  31 January 2011

Sang-Jin Lee
Affiliation:
Department of Materials Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
Waltraud M. Kriven
Affiliation:
Department of Materials Science and Engineering, University of Illinois at Urbana–Champaign, Urbana, Illinois 61801
Jeong-Hyun Park
Affiliation:
Department of Ceramic Engineering, Yonsei University, Seoul, Korea
Young-Soo Yoon
Affiliation:
Department of Electrical Engineering, University of Minnesota, Minneapolis, Minnesota 55455
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Abstract

The adhesion strength between a low-firing substrate consisting of an alumina/glass composite and a copper thick film was affected by the addition of cupric oxide and glass frit to the copper paste in a new co-firing process. An interlayer, 3–4 μm in thickness, was produced in the metal-ceramic interface during the new co-firing process due to the diffusion of copper. At the same time, the adhesion strength was improved by controlling the cupric oxide content. The addition of about 3 wt.% glass frit (softening point = 670 °C, based on the calcium-barium borosilicate glass composition) to the metal paste resulted in highest adhesion strength of 3 kg/mm2 with a shift of the debonding site toward the ceramic substrate within the interlayer. The shift of the debonding site could be observed by comparing the ratios of Al2O3/Cu and Ca concentration at the test pad areas on the substrate after debonding. The shift of the debonding site is attributed to the migration of glass frit into the interfacial region. The migration of glass frit occurred easily when the softening point of the glass frit was compatible with the new co-firing process, regardless of how much frit was used.

Type
Articles
Copyright
Copyright © Materials Research Society 1997

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