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Autostoichiometric vapor deposition: Part I. Theory

Published online by Cambridge University Press:  03 March 2011

Ren Xu
Ren Xu
Affiliation:
Department of Materials Science and Engineering, University of Utah, Salt Lake City, Utah 84112
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Abstract

The possibility of an autostoichiometric vapor deposition is explored. Heterometal-organic complexes such as double alkoxides are potential candidate precursors for such deposition. Two reaction schemes, the hydrolysis-assisted pyrolysis and the hydrolysis-polycondensation of double alkoxides, are identified to be autostoichiometric reactions. A simple low-pressure apparatus is suggested for autostoichiometric vapor deposition. Mass-flow analysis allows for the identification of a nonstoichiometry factor K which can be used as a quantitative measure of the precursor's autostoichiometric capability.

Type
Articles
Information
Journal of Materials Research , Volume 10 , Issue 10 , October 1995 , pp. 2536 - 2541
Copyright
Copyright © Materials Research Society 1995

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