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Analysis of the Reservoir Length and its Effect on Electromigration Lifetime

Published online by Cambridge University Press:  31 January 2011

H.A. Le ,
Larry Ting ,
N.C. Tso  and
C-U. Kim
H.A. Le
Affiliation:
Materials Science and Engineering Department, The University of Texas at Arlington, P.O. Box 19016, Arlington, Texas 76006
Larry Ting
Affiliation:
Dallas Reliability –413, 5200 NE Elam Young Parkway, Hillsboro, Oregon 97124–6497
N.C. Tso
Affiliation:
Intel Corporation, M.S. RA2-413, 5200 NE Elam Young Parkway, Hillsboro, Oregon 97124-6497
C-U. Kim
Affiliation:
Materials Science and Engineering Department, The University of Texas at Arlington, P.O. Box 19016, Arlington, Texas 76006
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Abstract

This report studies the electromigration performance of W-plug via structures under the reservoir effect. The lifetime improvement factor M was observed to be a weak function of the stressing current and approximately equal to 2. A Simple model is included in the report to explain this observation. The model also predicts the most effective reservoir length for electromigration lifetime improvement.

Type
Articles
Information
Journal of Materials Research , Volume 17 , Issue 1 , January 2002 , pp. 167 - 171
Copyright
Copyright © Materials Research Society 2002

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