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Aligned Diamond Nanowhiskers

Published online by Cambridge University Press:  31 January 2011

Eun-Song Baik
Affiliation:
Thin Film Technology Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130–650, Korea
Young-Joon Baik*
Affiliation:
Thin Film Technology Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongryang, Seoul 130–650, Korea
Dongryul Jeon
Affiliation:
Department of Physics, Myong Ji University, Yongin Kyunggi-do, Seoul 449–728, Korea
*
a)Address all correspondence to this author. e-mail: [email protected]
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Abstract

We investigated the formation of nanowhiskers by means of air plasma dry etching using diamond films of two different kinds: as-grown diamond films and films with molybdenum (Mo) deposits. As for the as-grown diamond films, nanowhiskers were found to form preferentially at grain boundaries of diamond crystals. Auger depth profile analysis of the etched films revealed a progressive enrichment by Mo toward the whisker tip, resulting from accidental sputtering of Mo substrate holder. With dry etching of diamond films with preformed Mo deposits, well-aligned whiskers 100 nm in diameter were found to form uniformly over the entire film surface with a population density of 30/μm2. From these findings, it follows that Mo deposits serve as micromasks for the formation of the nanowhiskers. It was also confirmed that these whiskers showed excellent field-emission behavior.

Type
Articles
Copyright
Copyright © Materials Research Society 2000

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References

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