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Adhesion, passivation, and resistivity of a Ag(Mg) gate electrode for an amorphous silicon thin-film transistor

Published online by Cambridge University Press:  31 January 2011

Jaegab Lee ,
Heejung Yang ,
Jinhyung Lee ,
Hyunjung Shin ,
Jiyoung Kim ,
Changoh Jeong ,
Beomseok Cho ,
Kyuha Chung  and
Eungu Lee
Jaegab Lee
Affiliation:
School of Advanced Materials Engineering, Kookmin University, Seoul 136–702, Korea
Heejung Yang
Affiliation:
School of Advanced Materials Engineering, Kookmin University, Seoul 136–702, Korea
Jinhyung Lee
Affiliation:
School of Advanced Materials Engineering, Kookmin University, Seoul 136–702, Korea
Hyunjung Shin
Affiliation:
School of Advanced Materials Engineering, Kookmin University, Seoul 136–702, Korea
Jiyoung Kim
Affiliation:
School of Advanced Materials Engineering, Kookmin University, Seoul 136–702, Korea
Changoh Jeong
Affiliation:
R&D Team, AMLCD Division, Samsung Electronics Company, Ltd., Kiheung-Eup, Yongin 449–711, Korea
Beomseok Cho
Affiliation:
R&D Team, AMLCD Division, Samsung Electronics Company, Ltd., Kiheung-Eup, Yongin 449–711, Korea
Kyuha Chung
Affiliation:
R&D Team, AMLCD Division, Samsung Electronics Company, Ltd., Kiheung-Eup, Yongin 449–711, Korea
Eungu Lee
Affiliation:
Department of Materials Engineering, Chosun University, Kwangju 501–759, Korea
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Abstract

The effect of Mg in Ag(Mg)/SiO2/Si multilayers on the adhesion, passivation, and resistivity following vacuum annealing at 200–500 °C has been investigated. The annealing of Ag(Mg)/SiO2/Si multilayers produced surface and interfacial MgO layers, resulting in a MgO/Ag/MgO/SiO2/Si structure. The formation of a surface MgO/Ag bilayer structure provided excellent passivation against air and CF4 plasma chemistry. In addition, the adhesion of Ag to SiO2 was improved due to the formation of an interfacial MgO layer resulting from the reaction of segregated Mg with SiO2. However, the negligible solubility of Si in Ag prevented the dissolution of free silicon into the Ag(Mg) film produced from the reaction Mg + SiO2 = MgO + free Si, which in turn limited the reaction between Mg and SiO2, which led to a decrease in the adhesion of Ag to SiO2 at the higher temperature. The use of an O2 plasma prior to Ag(Mg) alloy deposition on SiO2 produced an oxygen-rich surface on the SiO2, which allowed for the enhanced reaction of the segregated Mg and SiO2 at the surface, thus resulting in markedly increased adhesion properties.

Type
Articles
Information
Journal of Materials Research , Volume 18 , Issue 6 , June 2003 , pp. 1441 - 1446
Copyright
Copyright © Materials Research Society 2003

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