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High power density SiGe millimeter-wave power amplifiers

Published online by Cambridge University Press:  01 July 2011

Thomas J. Farmer*
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Ali Darwish
Affiliation:
The American University in Cairo, AUC Avenue, New Cairo 11835, Egypt
Benjamin Huebschman
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Edward Viveiros
Affiliation:
The US Army Research Laboratory, 2800 Powder Mill Road, Adelphi, MD 20783, USA. Phone: +001 301 394 0487
Mona E. Zaghloul
Affiliation:
Department of Electrical and Computer Engineering, The George Washington University, 801 22nd Street NW, Washington, DC, 20052, USA
*
Corresponding author: T. J. Farmer Email: [email protected]

Abstract

This paper presents measured results for two-stage and three-stage high-voltage/high-power (HiVP) amplifiers implemented in a commercial 0.12 μm silicon germanium (SiGe) heterojunction bipolar transistor (HBT) bipolar Complementary Metal Oxide Semiconductor (BiCMOS) process at millimeter wave. The HiVP configuration provides a new tool for millimeter-wave silicon designers to achieve large output voltage swings, high output power density, customizable bias, and a way to minimize, if not eliminate, matching circuitry at millimeter-wave frequencies. The two-stage amplifier has achieved a PSAT = 5.41 dBm with a power added efficiency (PAE) of 8.06% at center frequency 30 GHz. The three-stage amplifier has achieved a PSAT = 8.85 dBm with a PAE of 11.35% with a total chip area of 0.068 mm2 at center frequency 30 GHz. Simulation, layout, fabrication, and measurement results are presented in this paper.

Type
Research Papers
Copyright
Copyright © Cambridge University Press and the European Microwave Association 2011. This is a work of the U.S. Government and is not subject to copyright protection in the United States

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References

REFERENCES

[1]Cressler, J.D.: SiGe HBT Technology: a new contender for Si-based RF and microwave circuit applications. IEEE Trans. Microw. Theory Tech., 46 (5) (1998), 572589.CrossRefGoogle Scholar
[2]Reynolds, S.K. et al. : A silicon 60-GHz receiver and transmitter chipset for broadband communications. IEEE J. Solid-State Circuits, 41 (12) (2006), 28202831.CrossRefGoogle Scholar
[3]Komijani, A.; Natarajan, A.; Hajimiri, A.: A 24-GHz, + 14.5-dBm fully integrated power amplifier in 0.18 µm CMOS. IEEE J. Solid-State Circuits, 40 (9) (2005), 19011908.CrossRefGoogle Scholar
[4]Kuo, J.; Tsai, Z.; Wang, H.: A 19.1-dBm fully-integrated 24 GHz power amplifier using 0.18-μm CMOS technology, in European Microwave Integrated Circuit Conf., 2008. EuMIC 2008, 27–28 October 2008, 558–561.CrossRefGoogle Scholar
[5]Shigematsu, H.; Hirose, T.; Brewer, F.; Rodwell, M.: Millimeter-wave CMOS circuit design. IEEE Microw. Wirel. Compon. Lett., 53 (2) (2005), 472477.Google Scholar
[6]Rieh, J.; Greenberg, D.; Stricker, A.; Freeman, G.: Scaling of SiGe HBTs. Proc. IEEE, 93 (9) (2005), 15221538.Google Scholar
[7]Wang, H. et al. : MMICs in the millimeter-wave regime. IEEE Microw. Mag., 10 (1) (2009), 99117.CrossRefGoogle Scholar
[8]Rieh, J.: A brief overview of modern high-speed SiGe HBTs, in 8th Int. Conf. on Solid-state and Integrated Circuit Technology, 2006, ICSICT ‘06, 23–26 October 2006, 170–173.CrossRefGoogle Scholar
[9]Farmer, T.J.; Darwish, A.; Zaghloul, M.E.: A 2.4 GHz SiGe HBT high voltage/high power amplifier. IEEE Microw. Wirel. Compon. Lett., 20 (5) (2010), 286288.CrossRefGoogle Scholar
[10]Ezzeddine, A.K.; Huang, H.C.: The high voltage/high power FET (HiVP), in Radio Frequency Integrated Circuits (RFIC) Symp., 2003 IEEE, 8–10 June 2003, 215–218.Google Scholar