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X-ray Diffraction Studies of Polycrystalline Thin Films Using Glancing Angle Diffractometry

Published online by Cambridge University Press:  06 March 2019

R.A. Larsen ,
T.F. McNulty ,
R.P. Goehner  and
K.R. Crystal
R.A. Larsen
Affiliation:
Siemens Analytical X-ray Instruments, Inc. 5225-1 Verona Road, Madison WI 53711
T.F. McNulty
Affiliation:
Siemens Analytical X-ray Instruments, Inc. 5225-1 Verona Road, Madison WI 53711
R.P. Goehner
Affiliation:
Siemens Analytical X-ray Instruments, Inc. 5225-1 Verona Road, Madison WI 53711
K.R. Crystal
Affiliation:
Siemens Analytical X-ray Instruments, Inc. 5225-1 Verona Road, Madison WI 53711
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Abstract

The use of conventional θ/2θ diffraction methods for the characterization of polycrystalline thin films is not in general a satisfactory technique due to the relatively deep penetration of x-ray photons in most materials. Glancing incidence diffraction (GID) can compensate for the penetration problems inherent in the θ/2θ geometry. Parallel beam geometry has been developed in conjunction with GID to eliminate the focusing aberrations encountered when performing these types of measurements. During the past yearwe developed a parallel beam attachment which we have successfully configured to a number of systems.

Type
VI. Analysis of Thin Films by XRD and XRF
Information
Advances in X-Ray Analysis , Volume 32: Thirty-Seventh Annual Conference on Applications of X-ray Analysis, August 1-5, 1988 , 1988 , pp. 311 - 321
Copyright
Copyright © International Centre for Diffraction Data 1988

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References

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