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The Use of the Conventional Isolated Atom Model for the Theoretical Calculation of the Dependence of Lβ/Lα: Intensity Ratio on the Sample Exit Angle for Unoxidized and Oxidized Transition Metal Alloy Thin Films

Published online by Cambridge University Press:  06 March 2019

Francis Fujiwara  and
George Andermann
Francis Fujiwara
Affiliation:
Department of Chemistry, University of Hawaii Honolulu, Hawaii 96822
George Andermann
Affiliation:
Department of Chemistry, University of Hawaii Honolulu, Hawaii 96822
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Extract

Variable sample exit angle x-ray fluorescence spectroscopy (VEA-XRF) employing the Lβ/Lα intensity ratio for transition metals and their oxides has been shown to be useful for non-destructively studying transition metal surfaces and oxidation, as well as, superconductors. Thus the theoretical formulation of the Lβ/Lα intensity ratio dependence on the sample exit angle, θe, is of some interest and we develop it here. We also present methods of obtaining parameters needed in the formulation, such as Lβ absorption coefficients, which are not available in the literature, for wavelengths greater than about 12Å.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 845 - 850
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

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