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Total-Reflection X-ray Fluorescence of Thin Layers on and in Solids

Published online by Cambridge University Press:  06 March 2019

D. K. G. De Boer  and
W. W. van den Hoogenhof
D. K. G. De Boer
Affiliation:
Philips Research Laboratories P.O. Box 80000, 5600 JA Eindhoven, The Netherlands
W. W. van den Hoogenhof
Affiliation:
Philips Analytical Lelyweg 1, 7602 EA Almelo, The Netherlands
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Abstract

The angular dependence of Total-reflection X-Ray Fluorescence intensities can behave in various ways. The variety is discussed by examining the x-ray intensity distribution in the material under investigation. It is shown that for thin layers on solids, interference fringes are present due to x-ray standing waves. This phenomenon is exploited to determine the depth distribution of elements in layered specimens.

Type
I. Surface and Near-Surface X-Ray Spectroscopy
Information
Advances in X-Ray Analysis , Volume 34: Thirty-Ninth Annual Conference on Applications of X-ray Analysis, July 30 - August 3, 1990 , 1990 , pp. 35 - 40
Copyright
Copyright © International Centre for Diffraction Data 1990

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