Hostname: page-component-848d4c4894-2xdlg Total loading time: 0 Render date: 2024-07-01T12:06:38.430Z Has data issue: false hasContentIssue false
  • English
  • Français

New Developments in FP-Based Software for Both Bulk and Thin-Film XRF Analysis

Published online by Cambridge University Press:  06 March 2019

Liangyuan Feng ,
Brian J. Cross  and
Richard Wong
Liangyuan Feng
Affiliation:
Kevex Instruments 355 Shoreway Rd. San Carlos, CA 94070
Brian J. Cross
Affiliation:
Kevex Instruments 355 Shoreway Rd. San Carlos, CA 94070
Richard Wong
Affiliation:
Kevex Instruments 355 Shoreway Rd. San Carlos, CA 94070
Get access

Extract

In the last decade, the Fundamental Parameter (FT) method has been increasingly used in quantitative XRF analysis as an effective means for interelement effect corrections. Many authors have contributed to its continuous development both in theory and practice [1 - 26]. Among various implementations, the FP-alpha method has been used widely in bulk-sample analysis because of its unique advantage of speed [1 - 6]. In recent years, however, with the advent of faster computers, a rigorous full FP approach has become feasible and practical. This is especially true in the field of multilayer thin-film, analysis, where the FP-alpha approach has not yet been applied.

Type
X. Mathematical Methods in X-Ray Spectrometry (XRS)
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 703 - 709
Copyright
Copyright © International Centre for Diffraction Data 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. de Jongh, W. K., X-ray Spectr., 2: 151 (1973).Google Scholar
2. lachance, G. R. and Claisse, F., Adv. X-ray Anal., 23: 87 (1980) .Google Scholar
3. Tao, G., Pella, P. A. and Rousseau, R. M., “NBS Technical Note 1213”, (1985).Google Scholar
4. Rousseau, R. M., X-Ray Spectr., 15: 207 (1986).Google Scholar
5. Rousseau, R. M., X-Ray Spectr., 16: 103 (1987).Google Scholar
6. Feng, L., Pella, P. A. and Cross, B. J., Adv, x-ray Anal., 33: 509 (1990) .Google Scholar
7. Laguitton, D. and Parrish, W., Anal. Chem., 49(8) (1977).Google Scholar
8. Laguitton, D. and Mantler, M., Adv. X-ray Anal., 20: 515 (1977)Google Scholar
9. Huang, T. C., X-Ray Spectr., 10(1) (1981).Google Scholar
10. Mantler, M., Adv. X-ray Anal., 27: 433 (1984).Google Scholar
11. Mantler, M., Analytical Chemica Acta, 188: 25 (1986).10.1016/S0003-2670(00)86026-2Google Scholar
12. Huang, T. C. and Parrish, W., Adv. X-ray Anal., 29: 395 (1986) .Google Scholar
13. Willis, J. E., X-Ray Spectr., 18: 143 (1989).Google Scholar
14. de Boer, D. K. G. and Brouwer, P. N., Adv. X-ray Anal., 33: 237 (1990).Google Scholar
15. de Boer, D. K. G., X-Ray Spectr., 19: 145 (1990).Google Scholar
16. Kataoka, Y. and Arai, T., Adv. X-ray Anal., 33: 213 (1990).Google Scholar
17. Maldonado, J. R. and Maydan, D., The Bell System Technical Journal, October, 1851 (1979).Google Scholar
18. Linder, R., Kladnik, G. and Augenstine, J., X-Ray Imaging, Vol.II, Proc. Soc. Photo-Opt. Instrum. Eng., 691: 28 (1986).Google Scholar
19. Cross, B. J. and Wherry, D. C., Thin Solid Films, 166: 263 (1988).Google Scholar
20. Sherman, J., Spectrochimica Acta, 7: 283 (1955).Google Scholar
21. Criss, J. W. and Birks, L. S., Anal. Chem., 40(7) (1968).Google Scholar
22. Shiraiwa, T. and Fujino, N., Adv. X-ray Anal, 12: 446 (1969).Google Scholar
23. Pollai, G., Mantler, M. and Ebel, H., Spectrochimica Acta, 26 (B) :747 (1971)10.1016/0584-8547(71)80074-5Google Scholar
24. Criss, J. W., Birks, L. S. and Gilfrich, J. V., Anal. Chem., 50 (33) (1978).Google Scholar
25. Criss, J. W., Adv. X-Ray Anal., 23: 93 (1980).Google Scholar
26. Pella, P. A., Feng, L. and Small, J. A., X-Ray Spectr., 14: 125 (1985).Google Scholar