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Layer Thickness Determination of Thin Films by Grazing Incidence X-Ray Experiments using Interference Effect

Published online by Cambridge University Press:  06 March 2019

Kenji Sakurai  and
Atsuo Iida
Kenji Sakurai
Affiliation:
National Research Institute for Metals: 1-2-1 Sengen, Tsukuba Ibaraki 305, Japan
Atsuo Iida
Affiliation:
Photon Factory, National Laboratory for High Energy Physics 1-1 Oho, Tsukuba, Ibaraki 305, Japan
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Abstract

A novel method using Fourier transform algorithm is proposed to determine each layer thickness of multi-layered thin films from interference oscillation observed in X-ray specular reflection. The peak position in Fourier space gives each layer thickness of the film. The principle of the present technique as well as its applications are described.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 813 - 818
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

1. Parratt, L. G., Phys. Rev. 95: 359 (1954)10.1103/PhysRev.95.359Google Scholar
2. Marra, W. C., Eisenbergur, P. and Cho, A. Y., J. Appl. Phys. 50: 6927 (1979)10.1063/1.325845Google Scholar
3. Huang, T. C., Adv. in X-Ray Anal. 33: 91 (1990)Google Scholar
4. Heald, S. M., Chen, H. and Tranquada, J. M., Phys. Rev. B38: 1016 (1988)10.1103/PhysRevB.38.1016Google Scholar
5. Yun, W. B. and Bloch, J. M., J. Appl. Phys. 68: 1421 (1990)10.1063/1.346668Google Scholar
6. Bedzyk, M. J., Bommarito, G. M., Caffrey, M. and Penner, T. L., Science 248: 52 (1990)10.1126/science.2321026Google Scholar
7. Iida, A., Sakurai, K., and Gohshi, Y., Adv. in X-Ray Anal. 31: 487 (1988)Google Scholar
8. Sakurai, K. and Iida, A., Adv. in X-Ray Anal. 33: 205 (1990)Google Scholar
9. Iida, A., Adv. in X-Ray Anal. 34: 23 (1991)Google Scholar
10. Kiessig, H., Ann. Physik 10: 715 (1931)10.1002/andp.19314020607Google Scholar
11. Renninger, M., Z. Physik 100(1936)326.10.1007/BF01337647Google Scholar
12. Wainfan, N., Scott, N. J., and Parratt, L. G., J. Appl. Phys. 30: 1604 (1959)10.1063/1.1735008Google Scholar
13. Sauro, J. P., Bindell, J., and Wainfan, N., Phys. Rev. 143: 439 (1966)10.1103/PhysRev.143.439Google Scholar
14. Segmuller, A., Thin Solid Films, 18: 287 (1973)10.1016/0040-6090(73)90107-7Google Scholar
15. Segnwller, A., A.I.P. Conf. Proa, 53: 78 (1979)Google Scholar
16. Sakurai, K. and Iida, A., Jpn. J. Appl. Phys. 30 (1991) (in press)10.1143/JJAP.30.1899Google Scholar
17. Born, M. and Wolf, E., “Principles of Optics 6th ed.”, Pergamon, New York (1980)Google Scholar