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Determination of Ultra-Thin Carbon Coating Thickness by X-ray Fluorescence Technique

Published online by Cambridge University Press:  06 March 2019

R. L. White
Affiliation:
IBM General Products Division San Jose, CA 95193
T. C. Huang
Affiliation:
IBM Research Division Alma den Research Center San Jose, CA 95120
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Abstract

A tcchniquc for high-precision measurement of carbon thin-film thickness using X-ray fluorescence (XRF) is described. A quadratic calibration procedure is used for carbon thin films on silicon. Measurement of carbon-film thickness in a double-layer structure of carbon and CoCrX alloy is complicated by interference effects from the underlying layer. The dependence of the relative precision in measuring thickness (σT/T) on the counting time has been derived. It shows that a precision of 2% for a 25-nm carbon coating can be obtained using a W/C crystal and counting time of 4 minutes. Intensity and resolution advantages provided by the recently developed Ni/C and V/C multilayer synthetic crystals are also described.

Type
VI. Analysis of Thin Films by XRD and XRF
Copyright
Copyright © International Centre for Diffraction Data 1988

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References

1. Cullity, B. D. , Elements of X-Ray Diffraction, 2nd ed. (Reading, Mass. : Addison-Wesley, 1978).Google Scholar
2. Huang, T.C. , Thin Solid Films, 157, 283 (1988); and references therein.Google Scholar
3. Nicolosi, J.A. , Groven, J.P. , and Merlo, D. , Adv. X-Ray Anal. , 30, 183 (1987).Google Scholar
4. Arai, T. , Adv. X-Ray Anal, 30, 213(1987).Google Scholar