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Determination of Thickness and Composition of Thin AlxGa1-xAs Films on GaAs substrates by Total Electron Yield (Tey) Measurements

Published online by Cambridge University Press:  06 March 2019

Horst Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Robert Svagera
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Maria F. Ebel
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
Norbert Zagler
Affiliation:
Technische Universität Wien Institut für Angewandte und Technische Physik A 1040 Vienna (Austria), Wiedner HaupstraBe 8-10
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Extract

In our paper “Determination of thickness and composition of thin AlxGa1-xAs layers on GaAs by total electron yield (TEY)” we described the principles of the determination of thickness t and Al concentration x employing TEY. The essential experimental quantities are the absorption edge jumps of the-eleraents measured in TEY-mode:

Since the problem asks for the quantification of two unknowns (x,t), at least two TEYjumps are needed. The K jumps of Al and Ga deliver reliable information. From the theoretical approach1,2 of quantitative TEY a nearly linear relationship between the measured TEY jumps and the composition (in wt%) has to be expected. The As concentration varies over the interesting composition range 0<x<0.6 from approximately 50 to 60wt% and causes a similar variation of the TEY jump versus x. In combination with the statistical significance of the experimental data we neglect the TEY K jump information from As.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

1 Ebel, M. F., Svagera, R., Ebel, H., Hobl, R., Mantler, M., Wernisch, J., and Zagler, N., Adv. X-Ray Anal. 38 (1995) (in press)Google Scholar
2 Ebel, H., Svagera, R., and Zagler, N., Adv. X-Ray Anal 38 (1995) (in press)Google Scholar
3 Ebel, H., Svagera, R., Ebel, M. F., Zagler, N., Werner, W. S. M., Stori, H., and Gröschl, M. Adv. X-Ray Anal. (this volume)Google Scholar