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Depth profiling by Xrf with Variable Beam Geometry Applied to Thin Films in the Nanometer Region

Published online by Cambridge University Press:  06 March 2019

Horst Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Robert Svagera
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Robert Hobl
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Werner Kugler
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
Hung Danh Nguyen
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien A 1040 Vienna (Austria), Wiedner Hauptstraβe 8-10
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Extract

Standard applications of quantitative XRF are determinations of composition of bulk specimens, composition and thickness of thin multielement layers and thickness of thin element layers. The theoretical background was given by Sherman, and Shiraiwa and Fujino Numerous approaches like empirical coefficients and fundamental parameters were developed and deliver valuable results. Extending the methods to a quantification of very thin layers consisting of more than one chemical element, it becomes more and more complicated to split the solutions into thickness and composition. The explanation is given by the improving validity of the linear approach for the measured signals in dependence on thickness and composition due to the thin layer approximation exp(x)≈l+x. This leads finally to the finding that measured characteristic signals are proportional to the product c-t, where c represents the concentration of the chemical element under investigation and t the thickness of the layer.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1995

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References

1 Sherman, J., SpectrochimActa 7: 283 (1955)Google Scholar
2 Shiraiwa, T., and Fujino, N., Jpn. J. AppI. Phys. 5: 886 (1966)Google Scholar
3 Schoβmann, B., Ebel, H., Wiederschwinger, H., and Wernisch, J., Adv. X-Ray Anal, (this volume)Google Scholar