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Verification of Stability and Precision for Energy-Dispersive XRF Systems

Published online by Cambridge University Press:  06 March 2019

J.C. Russ ,
R. Jenkins ,
R.B. Shen  and
A.O. Sandborg
J.C. Russ
Affiliation:
EDAX International, Inc., Prairie View, IL 60069
R. Jenkins
Affiliation:
EDAX International, Inc., Prairie View, IL 60069
R.B. Shen
Affiliation:
EDAX International, Inc., Prairie View, IL 60069
A.O. Sandborg
Affiliation:
EDAX International, Inc., Prairie View, IL 60069
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Extract

Instrument specifications as published by manufacturers generally include values for stability of various parameters or components. For an X-ray fluorescence system, a typical example might be the generator high voltage stability (perhaps 0.01%). Parameters of this sort are of course of some use in comparing systems, and they may be (and often are) of great importance to the manufacturer as a criterion of manufacturing quality. It is difficult for the user to know how any single one, or combination of these factors really affect the total system performance as it may relate to his application.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 21: Twenty-Sixth Annual Conference on Applications of X-ray Analysis, August 3-5, 1977 , 1977 , pp. 229 - 240
Copyright
Copyright © International Centre for Diffraction Data 1977

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References

1. Nockolds, C.; “Computer-assisted Analyzer Calibration,” EDAX EDITor Vol. 6 # 3 p. 57. (pub. quarterly, EDAX Int., Prairie View, IL).Google Scholar
2. Sandborg, A.O., Russ, J.C.; “Counting Rate Performance of Pulsed-Tube Systems,” Vol. 20, Advances in X-Ray Analysis, Plenum Publ. Corp., N.Y. (1977).Google Scholar
3. Russ, B.C.; “Getting Accurate Intensity Values from Energy Dispersive X-Ray Spectra Using Fixed Energy Windows,” Vol. 21, Advances in X-Ray Analysis, Plenum Publ. Corp., N.Y, (1977).Google Scholar
4. Hooton, K.A.H., Parsons, M.L.; “Equipment Stability in X-Ray Fluorescence Spectrometry and Radioactive Counting - A Statistical Approach”, Analytical Chemistry, Vol. 45, # 13, Nov. 1973, p. 2218–2227.Google Scholar