Hostname: page-component-78c5997874-t5tsf Total loading time: 0 Render date: 2024-11-20T05:04:01.845Z Has data issue: false hasContentIssue false

The Use of Energy Dispersive Diffractometry to Measure the Thickness of Metal and Glass Thin Films

Published online by Cambridge University Press:  06 March 2019

Glen A. Stone*
Affiliation:
South Dakota School of Mines and Technology Rapid City, South Dakota
Get access

Extract

This paper presents a new method to measure the thickness of very thin films on a substrate material using energy dispersive x-ray diffractometry. The method can be used for many film-substrate combinations. The specific application to be presented is the measurement of phosphosilicate glass films on single crystal silicon wafers.

Type
VIII. XRD Applications
Copyright
Copyright © International Centre for Diffraction Data 1981

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. DuRant, R., Proceedings of the 5th Conference on Chemical Vapor Depositions, p. 421 (1974).Google Scholar
2. Wong, J., J. Non-Crystalline Solids, 20, 83 (1976).Google Scholar
3. Kerr, D. R., Logan, J. S., Burkhardt, P. J. and Pliskin, W. A., IBM J. Res. Develop., 8, 376 (1964).Google Scholar