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Small, Area X-Ray Diffraction Techniques: Errors in Strain Measurement

Published online by Cambridge University Press:  06 March 2019

Thomas L. Nunes  and
Charles C. Goldsmith
Thomas L. Nunes
Affiliation:
International Business Machines Corporation D/875 B/300-41C Route 52 Hopewell Junction, New York 12533
Charles C. Goldsmith
Affiliation:
International Business Machines Corporation D/875 B/300-41C Route 52 Hopewell Junction, New York 12533
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Abstract

The semiconductor industry is continually striving'for smaller, denser devices. Microdiffractometry is an analytical technique which endeavors to apply x-ray diffraction techniques for measuring strain and phase information to areas approaching 50 micrometers diameter or less.

This study extends the work of Goldsmith and Walker in the measurement of strain using the lattice distortion or sin2(ψ) plot method.

The systematic errors arising from both sample and beam displacement relative to the center of rotation of the cample ie examined. A relationship is derived which predicts the influence of these displacements upon the slope of a stress plot. The predictions are compared to experiment.

The influence of random errors arising from particle size and photon counting statistics will also be discussed. Guidelines will be presented which will minimize both systematic and random errors.

Type
I. Microbeam Techniques and Imaging Methods for Materials Characterization
Information
Advances in X-Ray Analysis , Volume 31: Thirty-Sixth Annual Conference on Applications of X-ray Analysis, August 3-7, 1987 , 1987 , pp. 77 - 85
Copyright
Copyright © International Centre for Diffraction Data 1987

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References

1. Goldsmith, C.C. and Walker, G.A., Adv. X-ray Anal., 27, 229 (1984).Google Scholar
2. Nichols, M.C. and Ryon, R.W., Adv. X-ray Anal., 29, 423 (1986)Google Scholar
3. Steinmeyer, P.A., Adv. X-ray Anal., 29, 251 (1986).Google Scholar
4. Cullity, B.D.: Elements of X-ray Diffraction, 2nd ed., Addison-Wesley, Reading, Ka., 1978, pp 447–479,Google Scholar
5. Ibid, pp 474-476.Google Scholar
6. Nunes, T.L., Mini and Microcomputers, 5, 130 (1979)Google Scholar
7. Warquardt, D.W., J. Soc. Indust. Appl. Math., J.L. 431 (1963).Google Scholar
8. Draper, N. and Smith, H.; Applied Regression Analysis, 2nd ed., Wiley, New York, 1966, pp 8–33.Google Scholar
9. Wilson, , British J. Appl. Phys., 16, 665 (1965).Google Scholar