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The Pseudo-Kossel Technique in Back Reflection as a Tool for Measuring Strains

Published online by Cambridge University Press:  06 March 2019

H. M. Berg
Affiliation:
Motorola Semiconductor Products Division Phoenix, Arizona 85008
E. L. Hall
Affiliation:
Motorola Semiconductor Products Division Phoenix, Arizona 85008
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Abstract

The back reflection x-ray divergent beam technique is examined as a tool for studying elastic strains. In particular, a method of calculating interplanar spacings using a least squares fit of experimental "conic" coordinates to Newman's general equation for back reflection (J. Appl. Cryst. 3 (1970) 191) is described. Using this technique, interplanar spacings can be obtained from partial conies. To determine the precision of this method an unstrained silicon single crystal is studied, and the errors associated with determining its interplanar spacings are discussed. The technique is then applied to elastically strained silicon and the results compared to theoretical predictions. It is shown that strains down to 2 × 10−5 are readily measured on high angle planes in silicon.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1974

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References

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