Hostname: page-component-586b7cd67f-t7czq Total loading time: 0 Render date: 2024-11-23T15:09:50.501Z Has data issue: false hasContentIssue false

Intensity and Distribution of Background X-rays in Wavelength Dispersive Spectrometry III

Published online by Cambridge University Press:  06 March 2019

Tomoya Arai
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
Takashi Shoji
Affiliation:
Rigaku Industrial Corporation Takatsuki, Osaka, Japan
Get access

Extract

In the spectroscopic analysis of composite elements by x-ray fluorescence (XRF), it is the fundamental feature of this method that the background x-ray intensity is lower than that with electron excitation. However, the background x-rays of this method, which consist of Thomson (Rayleigh) and Compton scattered x-rays from the primary radiation, impair the analytical performance at the ppm level. In order toinvestigate the intensity of the background x-rays precisely,the study was conducted in two parts. The first part compared the measured and theoretically calculated x-ray intensities for Rh Kα and Rh Kβ peaks from various materials. The second part examined the determination of low concentrations of lead,arsenic and colonium in steel samples. The variation in the background x-ray intensities of the analyzed elements was found to be caused by the variation of the major elements and a correction equation for it is derived.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Arai, T., Adv. X-ray Anal., 31 (1988), pp. 507514 and T. Arai, Adv. X-ray Anal., 32. (1989), pp. 83-87Google Scholar