Hostname: page-component-78c5997874-fbnjt Total loading time: 0 Render date: 2024-11-19T07:26:35.289Z Has data issue: false hasContentIssue false
  • English
  • Français

EDXRF Analysis of Thin Films and Coatings Using a Hybrid Alphas Approach

Published online by Cambridge University Press:  06 March 2019

Dennis J. Kalnicky
Dennis J. Kalnicky*
Affiliation:
Princeton Gamma - Tech 1200 State Road Princeton, NJ 08540
Get access

Extract

In the semiconductor and electronics industries the processes Involved in producing integrated circuit soften require thin films such as P205/SiO2, Si/Al, Ni/Cr, Fe/Ni, or others to be deposited on a substrate wafer. It is critical to the performance and life time of the device that the composition and thickness of these films be precisely controlled. The ability to quickly analyze wafers provides data which can be used to adjust fabrication parameters before large quantities of devices are lost.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 29: Thirty-Fourth Annual Conference on Applications of X-ray Analysis, August 5-9, 1985 , 1985 , pp. 403 - 411
Copyright
Copyright © International Centre for Diffraction Data 1985

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Rhodes, J.R., et al, ; Air” Qual. Instrum. (1974), 2, 1.; Environ. Science Tech. (1972), 6, 922; ISA. rans. (1972), 11, 337.Google Scholar
2. Van Espen, P., Adams, F.; Anal. Chim. Acta. (1974), 75 61.Google Scholar
3. Vanderstappen, M., Van Grieken, R.; Z. Anal. Chem. (1976). 282, 25. ”∼∼ Kainicky, D. J. ; “Analysis of Air, Stack Gas, and Solution Particulates by Secondary Target Energy-Dispersive X-ray Fluorescence”, paper no, 224, Pittsburgh Conference on Anaiytical Chiemistry and Applied Spectroscopy, Cleveland, Ohio, 1979.Google Scholar
4. Birks, L.S. ; Anal. Chem. (1977), 49, 1505.Google Scholar
5. Davis, D.W., et al.; Anal. Chem. (1977), 49, 1990.Google Scholar
6. Bertin, H.P.; “Principles and Practices of X-ray Spectrometic Analysis”, 2nd ed.; Plenum: New York, 1975.Google Scholar
7. Bergal, L., Cadieu, F.J. ; X-Ray Spectrom. (1980), 9, 19.Google Scholar
8. Birks, L.S. ; “X-Ray Spectrochemical Analysis”, 2nd. ed.; Interscience: New York, 1969.Google Scholar
9. Rhodes, J.R., et al.; Anal. Instrum. (1972), 10., 143.Google Scholar
10. Rhodes, J.R. ; “Recommended Procedures for use of C. S. I. Thin Standards for X-Ray Fluorescence Spectrometry”, ARD. nternai Report no. 206; Columbia Sciencetific Industries: Austin, Texas, 1975.Google Scholar
11. Laguitton, D., Parrish, W.; Anal.Chem. (1977), 49, 1152.Google Scholar
12. Kalnicky, D.J., Moustakes, T.D. ; Anal.Chem. (1981) sjjj3, 1792.Google Scholar
13. Kalnicky, D.J., Barbi, N.C., Schnerr, G.; “A new Quality Control Instrument to Determine Concentration and Thick- ness in Films”, presented at the International Forum for the Production of Electronic Coraponents, Wiesbaden, West Gerraany, 1982.Google Scholar
14. Kaltücky, D.O., “Mathemiatical Treatment of X-ray Data From Films on Substrates”, presented at the SUNYA. -ray Clinic, State University of NewYork at Albany, 1983.Google Scholar
15. Kalnicky, D.J. ; “Application of Energy-Dispersive Techniques for Materials Characterization”, paper no. 86; Eastern Analytica: Symposium, New York, 1984.Google Scholar
16. LaChance, G.R. ; “Introduction to Alpha Coefficients”, 1984. Available frora Corporation Scientifique Claisse, Inc. 2522, Chemin Sainte-Foy, SAINTE-FOY. Quebec), G1V. T5, Canada:Google Scholar
17. LaChance, G.R. ; “The Family of Alpha Coefficients in X-ray Fluorescence Analysis“: X-ray Spectrometry, (1979), 8, 190.Google Scholar
18. Criss, J.W. ; “ Fundamental Parameters Calculations on a Laboratory Computer”, Advances in X-ray Analysis, (1980), 23, 93S. -Ray Software Review, No.2, (1982).Google Scholar
19. Kalnicky, D.J. ; “A Combined Fundamental Alphas/Curve Fitting Algorithm Tor Routine XRF. aitipl e Analysis”, Denver X-ray Conference, Snow Mass, Colorado, 1985.Google Scholar
20. Statham, Peter J.; Anal. Chem. (1977), 49, 2149.Google Scholar