Hostname: page-component-78c5997874-mlc7c Total loading time: 0 Render date: 2024-11-19T17:40:43.223Z Has data issue: false hasContentIssue false
  • English
  • Français

Depth Profiling by Means of X-Ray Fluorescence Analysis

Published online by Cambridge University Press:  06 March 2019

H. Ebel ,
R. Svagera  and
S. Rezai Afshar
H. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
R. Svagera
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
S. Rezai Afshar
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
Get access

Extract

Sherman described the excitation of characteristic radiations by primary x-rays and by secondary excitation. The derivation has been made assuming a homogeneous sample. Criss and Birks inverted the problem from the calculation of fluorescent countrates to the quantitative XFA by means of fundamental parameters. Theoretical and instrumental developments enabled a reduction of the sample area and led to small area XFA and imaging XFA sytems. Depth profiling by means of XFA is a further development. We continue the original concept of variable take-off angle technique for the determination of film thicknesses without reference samples and apply the variation of the incidence angle to depth profiling.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 783 - 794
Copyright
Copyright © International Centre for Diffraction Data 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Sherman, J., Spectrochim.Acta 7, 283 (1985)10.1016/0371-1951(55)80041-0Google Scholar
2. Criss, J. W. and Birks, L. S., Anal.Chem. 40, 1080 (1968)10.1021/ac60263a023Google Scholar
3. Gurker, N., Adv.in X-Ray Anal. 23, 263 (1980)Google Scholar
4. Wherry, D. and Cross, B., Analyst 12, 8 (1986)Google Scholar
5. Boehme, D. R., Adv.in X-Ray Anal. 30, 39 (1987)Google Scholar
6. Carpenter, D. A., X-Ray Spectrom. 18, 253 (1989)10.1002/xrs.1300180603Google Scholar
7. Ebel, H., Z.Metallk. 56, 802 (1965)Google Scholar
8. Johnson, G. G. Jr. and White, E. W., X-Ray Emission and keV Tables for Nondiffractive Analysis, ASTM Data series DS 46, Philadelphia (1970)10.1520/DS46-EBGoogle Scholar
9. McMaster, W. H., del Grande, N. K., Mailett, J. H. arid Hubbell, J. H., Compilation of X-Eay Cross-Sections, UCRL-50174, Sect.II, Rev.l. Lawrence Radiation Laboratory, University of California, Livermore, CA (1969)Google Scholar