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Depth Profiling by Means of X-Ray Fluorescence Analysis

Published online by Cambridge University Press:  06 March 2019

H. Ebel ,
R. Svagera  and
S. Rezai Afshar
H. Ebel
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
R. Svagera
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
S. Rezai Afshar
Affiliation:
Institut für Angewandte und Technische Physik Technische Universität Wien, A 1040 Wien, Austria
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Extract

Sherman described the excitation of characteristic radiations by primary x-rays and by secondary excitation. The derivation has been made assuming a homogeneous sample. Criss and Birks inverted the problem from the calculation of fluorescent countrates to the quantitative XFA by means of fundamental parameters. Theoretical and instrumental developments enabled a reduction of the sample area and led to small area XFA and imaging XFA sytems. Depth profiling by means of XFA is a further development. We continue the original concept of variable take-off angle technique for the determination of film thicknesses without reference samples and apply the variation of the incidence angle to depth profiling.

Type
XI. Thin-Film and Surface Characterization by XRS and XPS
Information
Advances in X-Ray Analysis , Volume 35 , Issue B: First Pacific-International Congress on X-ray Analytical Methods (PICXAM). Fortieth Annual Conference on Applications of X-ray Analysis, August 7-16, 1991 , 1991 , pp. 783 - 794
Copyright
Copyright © International Centre for Diffraction Data 1991

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References

1. Sherman, J., Spectrochim.Acta 7, 283 (1985)10.1016/0371-1951(55)80041-0Google Scholar
2. Criss, J. W. and Birks, L. S., Anal.Chem. 40, 1080 (1968)10.1021/ac60263a023Google Scholar
3. Gurker, N., Adv.in X-Ray Anal. 23, 263 (1980)Google Scholar
4. Wherry, D. and Cross, B., Analyst 12, 8 (1986)Google Scholar
5. Boehme, D. R., Adv.in X-Ray Anal. 30, 39 (1987)Google Scholar
6. Carpenter, D. A., X-Ray Spectrom. 18, 253 (1989)10.1002/xrs.1300180603Google Scholar
7. Ebel, H., Z.Metallk. 56, 802 (1965)Google Scholar
8. Johnson, G. G. Jr. and White, E. W., X-Ray Emission and keV Tables for Nondiffractive Analysis, ASTM Data series DS 46, Philadelphia (1970)10.1520/DS46-EBGoogle Scholar
9. McMaster, W. H., del Grande, N. K., Mailett, J. H. arid Hubbell, J. H., Compilation of X-Eay Cross-Sections, UCRL-50174, Sect.II, Rev.l. Lawrence Radiation Laboratory, University of California, Livermore, CA (1969)Google Scholar