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An In Situ XRD Technique For Annealing Investigations

Published online by Cambridge University Press:  06 March 2019

D.E. Koylman ,
S.C. Axtel  and
B.W. Robertson
D.E. Koylman
Affiliation:
Center for Materials Research and Analysis Department of Mechanical Engineering University of Nebraska-Lincoln Lincoln, Nebraska 68588-0656
S.C. Axtel
Affiliation:
Center for Materials Research and Analysis Department of Mechanical Engineering University of Nebraska-Lincoln Lincoln, Nebraska 68588-0656
B.W. Robertson
Affiliation:
Center for Materials Research and Analysis Department of Mechanical Engineering University of Nebraska-Lincoln Lincoln, Nebraska 68588-0656
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Abstract

An in situ XRD technique employing a diffractometer equipped with a high temperature camera was used to investigate the annealing behavior of nanoerystalline copper powder produced by mechanical milling. Specimens were annealed isothermally for 12 h at temperatures between 480 and 770 K. The diffraction data was analyzed using a single-profile Fourier analysis technique. The activation energy for diffracting particle growth was determined to be 0.45 eV/atom.

Type
X. Structural and Other Applications of Powder Diffraction
Information
Advances in X-Ray Analysis , Volume 38: Forty-third Annual Conference on Applications of X-ray Analysis , 1994 , pp. 757 - 762
Copyright
Copyright © International Centre for Diffraction Data 1994

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References

1. Gangulee, A., J. Appl. Crystallogr. 7, 434 (1974).Google Scholar
2. Mignot, J. and Rondot, D., Acta Met. 23, 1321 (1975).Google Scholar
3. Warren, B. E. and Averbach, B. L., J. Appl. Phys. 21, 595 (1950)Google Scholar
4. Stokes, A. R., Proc. Phys. Soc. London 61, 382 (1948).Google Scholar
5. Rothman, R. L. and Cohen, J. B., Advan. X-Ray Anal. 12, 208 (1969).Google Scholar
6. Ganesan, P., Kuo, H. K., Saavedra, A. and DeAngelis, R. J., J. Catal. 52, 310 (1978).Google Scholar