Determining what external stimuli influence cell differentiation, morphology, and growth continues to be a focus on many research groups to meet the healthcare Grand Challenges. While prior work has shown the influence of stiffness, surface chemistry and topography, these parameters often change in tandem, making it difficult to delineate the role of an individual component. This study examined the possible incorporation of microelectronic processing to produce reusable substrates for cell guidance studies. Subsequent plating of substrates cleaned with methods common in a microelectronic fabrication process showed complex responses including migration. Optical characterization of surfaces after cleaning showed remaining cellular debris that could be removed through the incorporation of a piranha solution. The micro patterned substrates did allow controlled comparison between dental pulp stem cells and osteoblast cells. The dental pulp cells did not show any cell alignment or cell proliferation (as indicated by cell density) with the isotropic or anisotropic micropatterns on the initial plating. The osteoblast cells (control) only aligned with the lines and not any of the other patterns (dots, holes or hexagons).

Interference lithography has proven to be a useful technique for generating periodic sub-diffraction limited nanostructures. Interference lithography can be implemented by exposing a photoresist polymer to laser light using a two-beam arrangement or a one-beam configuration based on a Lloyd’s Mirror Interferometer. For typical photoresist layers, an anti-reflection coating must be deposited on the substrate to prevent adverse reflections from cancelling the holographic pattern of the interfering beams. For silicon substrates, such coatings are typically multilayered and complex in composition. By thinning the photoresist layer to a thickness well below the quarter wavelength of the exposing beam, we demonstrate that interference gratings can be generated without an anti-reflection coating on the substrate. We used ammonium dichromate doped polyvinyl alcohol as the positive photoresist because it provides excellent pinhole free layers down to thicknesses of 40 nm, and can be cross-linked by a low-cost single mode 457 nm laser and etched in water. Gratings with a period of 320 nm and depth of 4 nm were realized, as well as a variety of morphologies depending on the photoresist thickness. This simplified interference lithography technique promises to be useful for generating periodic nanostructures with high fidelity and minimal substrate treatments.

Stretchable electronics represent an emerging class of devices that can be compressed, twisted and conform to very complicated shapes. The mechanical and electrical compliances of the technology promise to open up applications for healthcare, energy and entertainment purposes. However, advancement in the field has been hindered by material related constraints. Moreover, the current microfabrication facilities are optimized for rigid substrates such as silicon, which have significant different properties compared to elastomers. In this paper, four categories of enabling technologies for stretchable electronics commercialization are critically reviewed, namely: the novel design of stretchable structures, use of non-conventional materials, state-of-art printing techniques and also the patterning of electrodes or metal interconnects via conventional manufacturing techniques.

Intrinsically conductive polymers have received increased attention in the biomedical field due to their mechanical flexibility, electronic and ionic conductivity. On the other hand, bio-derived polymers such as silk proteins (fibroin and sericin) are an important set of materials to realize mechanically deformable, biocompatible and biodegradable systems. Here, we show a ‘green’ approach to fabricate micropatterned, flexible biosensors using photoreactive silk proteins in conjunction with conductive polymers. A functional ink comprised of poly(3,4-ethylene dioxythiophene: poly(styrene sulfonate) (PEDOT:PSS) with silk sericin as a carrier enables the formation of high resolution conducting micropatterns on a silk fibroin substrate via photolithography. The flexible and conformable organic device formed can be used to sense biomolecules with high sensitivity and selectivity. The micropatterned functional silk composites are made using an all water-based fabrication approach, and shown to be cell friendly and degradable. Such systems can find applications in implantable optical devices, bio-sensors, and bio-optoelectronic devices.

We discuss the self-folding of patterned metallic sheets using both differential stress and surface forces. The advantageous characteristics of the technique include, (a) The creation of 3D patterned corrugated metamaterials with pattern resolution limited only by that of planar lithography. Since planar lithography is highly versatile, a variety of patterns with different sizes and shapes can be formed. (b) The hands-free and wire-free self-folding of these materials use two orthogonal forces derived from the release of residual stress and the minimization of surface tension. Hence, this process is highly parallel and scalable allowing such materials to be mass produced. (c) Finally, the edges of the materials self-align and seal due to capillary forces of the liquid hinges—this self-sealing enhances overall rigidity and strength of the materials.

Consequently, the self-folding of patterned and sealed “egg-crate” shaped metamaterials was realized. Patterns were incorporated in the form of “smart” patches on the walls of the egg-crates which can be selectively functionalized with biomolecules. Apart from the intellectual appeal of these hands-free, self-sealing materials, we envision applicability of these egg-crate like microstructures in lab-on-a-chip assays as functionalized microwells and as light weight mechanical metamaterials.

Organ shortage is a severe challenge worldwide. Three-dimensional (3D) printing, a rapidly developing engineering and materials science tool, holds considerable promise in generating implantable organ scaffolds that may reduce or eliminate organ shortage. However, translation of 3D printing into clinical therapies has been astonishingly slow and certainly has not matched the pace of technology development. This review outlines challenges and opportunities for the application of 3D printing in tissue and organ regeneration, with emphasis on in vivo applications of 3D-printed scaffolds. Three-dimensional-printed scaffolds for the regeneration of complex tissues and organs, including bone, cartilage, tooth, and skin, serve as prototypes for 3D printing of other tissues and organs such as the liver, kidney, or heart. The aspiration to reduce or eliminate organ shortage appears to hinge on the translation of 3D bioprinting technologies into preclinical studies and clinical trials. The remaining challenges of cell survival, directed differentiation, angiogenesis, and metabolic exchange are far from trial and need to be addressed. Three-dimensional-printed materials will remain a biomaterials and engineering showcase unless applications in preclinical and clinical models are realized. In balance, 3D printing holds considerable promise in regenerative medicine as a unique approach to address organ shortage.

Ordered carbon nanotube (CNT) growth by deposition of nanoparticle catalysts using dip pen nanolithography (DPN) is presented. DPN is a direct write, tip based lithography technique capable of multi-component deposition of a wide range of materials with nanometer precision. A NanoInk NLP 2000 is used to pattern different catalytic nanoparticle solutions on various substrates. To generate a uniform pattern of nanoparticle clusters, various conditions need to be considered. These parameters include: the humidity in the vessel, temperature, and tip-surface dwell time. By patterning different nanoparticle solutions next to each other, identical growth conditions can be compared for different catalysts in a streamlined analysis process. Fe, Ni, and Co nanoparticle solutions patterned on silicon, mica, and graphite substrates serve as nucleation sites for CNT growth. The CNTs were synthesized by a chemical vapor deposition (CVD) reaction. Each nanoparticle patterned substrate is placed in a tube furnace held at 725°C during CNT growth. The carbon source used in the growth chamber is toluene. The toluene is injected at a rate of 5 mL/hr. Growth is observed for Fe and Ni nanoparticle patterns, but is lacking for the Co patterns. The results of these reactions provide important information regarding efficient and highly reproducible mechanisms for CNT growth.

Nanosphere lithography (NSL) is a technique capable of creating large-area arrays of small objects with tailor-made shapes. Here we present an algorithm, which simulates the shape and morphology of nanoparticles produced via NSL in combination with physical vapor deposition from variable angles. The key idea is based on a ray-tracing technique. Mask clogging effects have a major influence on the shape of resulting nanoobjects and are therefore taken into account. In addition, we implemented a metaball concept for the precise description of thermally modified masks. The calculated results are compared exemplarily with atomic force microscopy (AFM) data of experimentally fabricated nanostructures.

Soft lithographic printing techniques can be used to print nanoparticle dispersions with relative ease while allowing for a measureable degree of controllability of printed feature size. In this study, a Polydimethylsiloxane (PDMS) stamp was used to print multi-layered, porous, nanoparticle dispersions of titanium dioxide (TiO2), for use in a dye-sensitized solar cell application. The gelled patterns were then sintered and the surface of the printed sample was chemically analyzed.

X-ray photoelectron spectroscopy (XPS) was used to determine the surface constituents of the printed sample. The presence of a secondary peak feature located approximately 2.8 eV above the high resolution O1s core level binding energy peak was attributed to a contamination layer. Fourier transform infrared spectra (FTIR) of the printed sample revealed the presence of vibrational modes characteristic of the asymmetric bond stretching of silica, located at approximate wavenumbers of 1260 and 1030 cm-1.

Soft lithographic techniques are a viable manufacturing technique in a number of disciplines and sintered nano-oxide dispersions are readily used as reaction centers in a number of technologies. The presence of a residual, bonded silicate contamination layer may preclude the soft lithographic printing of chemically active oxide surfaces.

Interest in patterned polymer-based flexible nanodevices and sub-100 nm metal and transparent conducting nanostructured electrodes have led us to modify the traditional nanoimprint lithography technique to enable fabrication of an array of sub-100 nm diameter electrode structures. Transparent conducting electrodes (TCOs) are fabricated by coating one or multiple TCO layers of choice on top of a polymer nanostructured scaffold of appropriate dimension. By optimizing the thickness of each of these layers one may tune and optimize the trade-off between the conductivity and transparency of the sample. Incorporation of plasmonic materials such as Ag leads to interplay of localized and tunable surface plasmon resonances within the TCO structures. At plasmon resonance the reflection of the sample is minimized and absorption in the TCO structures dominates. Experimental and simulated reflection spectra of these structures are in good agreement, including the appearance of sharp spectral features that are absent in a simple planar analog. The simulated Brewster angle of the nanopillars decreases compared to the planar reference sample by up to 10-13 degrees depending on the height of the pillars and indicates a reduced effective refractive index. The depolarization factor obtained by ellipsometry is about 0.05, as anticipated for ellipsoidal pillars.

A novel process for the formation of pairs of opposing metallic nanotips within linear trenches on a silicon wafer is investigated in detail. The process is based on a spreading knife technique typically used in nanosphere lithography to generate monolayers of colloidal polystyrene beads. Here it is applied to initiate self-assembly of spheres in long linear trenches acting as a template for the sphere arrangement. The optimum blade velocity to deposit the spheres selectively and densely packed in the trench depends on the trench surface fraction and can be described by a modified Dimitrov model. It is demonstrated that the spheres can be used as a shadow mask to deposit metallic nanotips in a channel, which are electrically interconnected on each side of the trench, possibly enabling the control and manipulation of nanoobjects in the channel.

Here we present a single mask sacrificial molding process that allows ultrathin 2-dimensional membranes to be fabricated using biocompatible polymeric materials. For initial investigations, polycaprolactone (PCL) was chosen as a model material. The process is capable of creating 250-500 nm thin, through-hole PCL membranes with various geometries, pore-sizes and spatial features approaching 2.5 micrometers using contact photolithography. The technique uses a mold created from two layers of lift-off resist (LOR). The upper layer is patterned, while the lower layer acts as a sacrificial release layer for the polymer membrane. For mold fabrication, photoresist on top of the layers of lift-off resist is patterned using conventional photolithography. During development the mask pattern is transferred onto the first LOR layer and the photoresist is removed using acetone, leaving behind a thin mold. The mold is filled with a solution of the desired polymer. Subsequently, both the patterned and lower LOR layers are dissolved by immersion in an alkaline solution. The membrane can be mounted onto support structures pre-release to facilitate handling.

Scaling contact lithography (microcontact printing, microflexography, and nanoimprint lithography) to large roll-to-roll platforms will enable high speed, low cost lithographic patterning of surfaces. However, many details of robust implementations at the roll-to-roll scale remain an engineering challenge, including precise regulation of printing pressures and the stamp-substrate interaction. This paper introduces a method for precise control of contact pressure that can accommodate large dimensional variations, i.e. varying stamp and substrate thicknesses. This control algorithm is implemented on a simply supported roll positioning stage. Experimental results for microcontact printing and microflexography are shown both with in situ contact measurements on a pseudo substrate and with 5 um silver nanoparticle prints. Ultimately, this approach enables robust printing despite sensitive stamp patterns and large dimensional variations (> 10 μm) in substrates, stamps, and roll equipment.

Self-folding of thin films is a more deterministic form of self-assembly wherein structures curve or fold up either spontaneously on release from the substrate or in response to specific stimuli. From an intellectual standpoint, the study of the self-folding of thin films at small size scales is motivated by the observation that a large number of naturally occurring materials such as leaves and tissues show curved, wrinkled, or folded micro- and nanoscale geometries. From a technological standpoint, such a self-assembly methodology is important since it can be used to transform the precision of existing planar patterning methods, such as electron-beam lithography, to the third dimension. Also, the self-folding of graphene promises a means to create a variety of three-dimensional carbon-based micro- and nanostructures. Finally, stimuli responsive self-folding can be used to realize chemomechanical and tether-free actuation at small size scales. Here, we review theoretical and experimental aspects of the self-folding of metallic, semiconducting, and polymeric films.

Microcontact printing is a versatile patterning technique, but is often limited by deformation of the stamp pattern. This paper examines the sensitivity of stamp pressure distributions to variations in displacement when the microcontact printing stamp is mounted on a rigid roll. To this end, we examine analytic and numeric solutions to the contact problem and verify our models with experimental data. Using these results, we provide insight to process limits imposed by dimensional errors in the printing system.

Patterned micro- and nanowires of several compositions in the solution series of BixTey were electrochemically deposited using Electroplate and Lift (E&L) Lithography on Ultrananocrystalline Diamond (UNCD) templates. The composition of the deposited BixTey wires was controlled by mixing saturated solutions of bismuth nitrate and tellurium in various ratios in the electroplating bath. All wires were electroplated via pulsed depositions at -1.4V vs. the saturated calomel electrode (SCE). The morphology and composition of all wires were studied by scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS). In general, the BixTey wires were fine-grained and brittle, often fracturing during the liftoff process. By contrast, wires containing less than 5% Te are smooth, and strong enough to support their own weight without a supporting medium for a length of over 100 times the wire diameter.

As device sizes are scaled down nearly to their atomic limits, the development of economically viable methods which may continue to improve device performance in accordance with Moore’s Law becomes ever more challenging. The recently developed technique of Electroplate-and-Lift (E&L) lithography promises to be an inexpensive, widely applicable method for the reproducible, controlled fabrication of micro- and nanostructures. In this study, E&L is applied to the fabrication of patterned copper micro- and nanowires as a model system. Copper wires with diameters ranging from 10 m to 200 nm have been produced using a single ultrananocrystalline diamond (UNCD)TM template, by varying only the electroplating time.

To quantify the relationship between copper wire diameter and deposition time, wires were electroplated at -0.4 V vs. the saturated calomel electrode (SCE) for durations between 2.5 and 160 s, then imaged by optical microscopy and/or scanning electron microscopy (SEM). Images were analyzed by identifying wire segments with ImageJ and examining the statistical distribution of wire diameters using Excel. This analysis verified theoretical predictions of a linear dependence between mean wire diameter and the square root of growth time.

Short channel organic thin film transistors in bottom-gate, bottom contact configuration use typically gold metallization for the source and drain contacts because this metal can easily be cleaned from photoresist residuals by oxygen plasma or ultraviolet-ozone and allows also surface modification by self-assembled monolayers (e.g. thiols). Alternative low-cost bottom contact metallization for high performance short-channel organic thin film transistors are scarce because of the incompatibility of the bottom contact material with the cleaning step. In this work a new process flow, involving a temporary thin aluminum protection layer, is presented. Short channel (3.4 μm) pentacene transistors with lithographical defined and thiol modified silver source/drain bottom contacts (25 nm thick, on a 2 nm titanium adhesion layer) prepared according to this process achieved a saturation mobility of 0.316 cm2/(V.s), and this at a metal cost below 1% of the standard 30 nm thick gold metallization.

This paper provides an overview of directed self-assembly (DSA) options that exhibit potential for enabling extensible high-volume patterning of nanoelectronics devices. It describes the current set of research requirements, which a DSA technology must satisfy to warrant insertion consideration, and summarizes the state-of-the art. The primary focus is on chemical patterning and graphoepitaxial approaches to directing block copolymer (BCP) based assembly. These options exhibit the nearest-term potential, among the emerging DSA technologies, for satisfying projected International Technology Roadmap for Semiconductors (ITRS) patterning requirements. The paper concludes with a selected set of additional challenges, which represent potential barriers to the integration of directed BCP patterning into a nanoelectronics manufacturing line, as well as a few emerging application opportunities for related functional materials. A glossary of acronyms and terms may be found at the end of this manuscript.

One of the challenges in the development of molecular scale devices is the integration of nano-objects or molecules onto desired locations on a surface. This integration comprises their accurate positioning, their alignment, and the preservation of their functionality. Here, we proved how capillary assembly in combination with soft lithography can be used to perform DNA molecular combing to generate chips of isolated DNA strands for genetic analysis and diagnosis. The assembly of DNA molecules is achieved on a topologically micropatterned polydimethylsiloxane stamp inducing almost simultaneously the trapping and stretching of single molecules. The DNA molecules are then transferred onto aminopropyltriethoxysilane-coated surfaces. In fact, this technique offers the possibility to tightly control the experimental parameters to direct the assembly process. This technique does not induce a selection in size of the objects, therefore it can handle complex solutions of long (tens of kbp) but also shorter (a few thousands of bp) molecules directly in solution to allow the construction of future one-dimensional nanoscale building templates.