4 results
In situ ATR - FTIR spectroscopy of Hf(IV) tert butoxide adsorption on Si and Ge
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- Journal:
- MRS Online Proceedings Library Archive / Volume 917 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0917-E09-03
- Print publication:
- 2006
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Comparison of Chemical Vapor Deposited Hafnium Dioxide and Silicon Doped Hafnium Dioxide using either O2, N2O, H2O, O2 plasma, or N2O plasma, and Hf (IV) t-butoxide
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D7.8
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- 2004
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Reaction Processes for Low Temperature (<150°C) Plasma Enhanced Deposition of Hydrogenated Amorphous Silicon Thin Film Transistors on Transparent Plastic Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 507 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 19
- Print publication:
- 1998
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Reaction Processes for Low Temperature (<150°C) Plasma Enhanced Deposition of Hydrogenated Amorphous Silicon Thin-Film Transistors on Transparent Plastic Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 508 / January 1998
- Published online by Cambridge University Press:
- 10 February 2011, 19
- Print publication:
- January 1998
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