11 results
Thermal Curing Conditions for Low K-Fluorinated Polyimide Film for Use as the Interlayer Dielectric in ULSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 443 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 71
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- 1996
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Surface Passivation of Cu by Annealing Cu/Al Multilayer Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 391 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 321
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- 1995
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Investigations of The Low Dielectric Constant Fluorinated Polyimide for Use as The Interlayer Dielectric in ULSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 31
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- 1995
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Surface Layer Formation During the Chemical Mechanical Polishing of Copper Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 133
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- 1994
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Growth Kinetics and Materials Properties of Cu5Si
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 189
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- 1994
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Inlaid Copper Multilevel Interconnections Using Planarization by Chemical-Mechanical Polishing
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- Journal:
- MRS Bulletin / Volume 18 / Issue 6 / June 1993
- Published online by Cambridge University Press:
- 29 November 2013, pp. 46-51
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- June 1993
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Ultra Thin Sacrificial Diffusion Barriers - Control of Diffusion Across the Cu-SiO2 Interface
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- Journal:
- MRS Online Proceedings Library Archive / Volume 318 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 319
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- 1993
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Formation of Cobalt Silicides in Arsenic Implanted Cobalt on Silicon System
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- Journal:
- MRS Online Proceedings Library Archive / Volume 181 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 97
- Print publication:
- 1990
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Interactions of Copper with Interlayer Dielectrics and Adhesion Promoters / Diffusion Barriers.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 203 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 27
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- 1990
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Cobalt Silicide Formation on Polysilicon: Dopant Effects on Reaction Kinetics and Silicide Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 182 / 1990
- Published online by Cambridge University Press:
- 21 February 2011, 83
- Print publication:
- 1990
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Instabilities in the Mechanical Stress in Deposited SiO2 Films Caused by Thermal Treatments
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- Journal:
- MRS Online Proceedings Library Archive / Volume 181 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 463
- Print publication:
- 1990
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