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Beware of Artifacts When Characterizing Nanometer Device Features Smaller than a TEM Lamella Thickness in Semiconductor Wafer-foundries
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- Journal:
- Microscopy and Microanalysis / Volume 20 / Issue S3 / August 2014
- Published online by Cambridge University Press:
- 27 August 2014, pp. 1000-1001
- Print publication:
- August 2014
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Theoretical and Experimental Investigation of Thermal Stability of HfO2/Si and HfO2/SiO2 Interfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 731 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, W5.2
- Print publication:
- 2002
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Thermodynamic Stability of High-K Dielectric Metal Oxides ZrO2 and HfO2 in Contact with Si and SiO2
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B3.2
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- 2002
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