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Improved Reliability With a New Plasma Nh3 Process for 0.35μιη P+ Poly-Gate Nitrided Oxide P-Mosfet's
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- Journal:
- MRS Online Proceedings Library Archive / Volume 446 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 91
- Print publication:
- 1996
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Charge Trapping Properties of Thin Plasma Nitrided Oxides Induced by Nitrogen and Hydrogen Incorporation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 284 / 1992
- Published online by Cambridge University Press:
- 22 February 2011, 325
- Print publication:
- 1992
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Improvement of Wetting of Silicon on Insulator During Lamp Zone Melting Using Plasma Nitridation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 53 / 1985
- Published online by Cambridge University Press:
- 28 February 2011, 59
- Print publication:
- 1985
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