Articles
High-resolution electron microscopy of amorphization of Cu4 Ti3
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- 31 January 2011, pp. 617-628
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Detection of a metallic glass layer by x-ray diffraction
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- 31 January 2011, pp. 629-634
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The influence of applied stress on precipitate shape and stability
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- 31 January 2011, pp. 635-645
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Surface segregation in a dilute copper–silver alloy
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- 31 January 2011, pp. 646-651
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Laser alloying of Cu and Cr
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- 31 January 2011, pp. 652-660
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Wear properties of shock-consolidated amorphous and microcrystalline Ni-38 wt % Mo−8 wt % Cr-1. 5 wt % B alloy powders
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- 31 January 2011, pp. 661-666
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Microstructure and mechanical properties of synthetic opal: A chemically bonded ceramic
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- 31 January 2011, pp. 667-674
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Electrical and thermal transport properties of the Y1 − x Mx CrO3 system
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- 31 January 2011, pp. 675-684
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Cesium and bromine doping into hexagonal boron nitride
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- 31 January 2011, pp. 685-692
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Internal gettering heat treatments and oxygen precipitation in epitaxial silicon wafers
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- 31 January 2011, pp. 693-697
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Effect of pre- and postepitaxial deposition annealing on oxygen precipitation in silicon
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- 31 January 2011, pp. 698-704
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The diffusion of antimony in heavily doped and n- and p-type silicon
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- 31 January 2011, pp. 705-711
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Strain measurement in heteroepitaxial layers—Silicon on sapphire
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- 31 January 2011, pp. 712-716
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Effects of low-energy electron bombardment on the surface chemical structure and adhesive properties of polytetrafluoroethylene (PTFE)
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- 31 January 2011, pp. 717-723
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Commentaries and Reviews
Review: The nucleation of disorder
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- 31 January 2011, pp. 724-732
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Errata
Erratum: “Electronic transport and microstructure in MoSi2 thin films” [J. Mater. Res. 1, 493 (1986)]
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- 31 January 2011, p. 733
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