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Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.
Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.
The Executive Program Group for Microscopy and Microanalysis 2004 set
out with the challenge of drafting a compelling scientific program for
the annual meetings of the Microscopy Society of America (MSA) and the
Microbeam Analysis Society (MAS) that would be equal to the excitement
of organizational change being discussed by the societies. We feel that
we have met the challenge, providing a diverse and balanced program
that looks forward to new opportunities and presents the current
state-of-the-art for microscopy and microanalysis. For the third
consecutive year, the program is strengthened by the co-sponsorship of
the International Metallographic Society (IMS), which is fast becoming
an annual partner in the M&M meetings. M&M is the largest
annual meeting of its kind in the world, and features an awesome
commercial exhibit of microscopy and microanalysis equipment and
accessories, with the latest commercial innovations featured and
available for hands-on demonstration. We envision Savannah as a venue
that will be remembered for historic steps forward in science and
technology. The heart of the program comprises symposia in areas of
biological sciences applications, physical sciences applications, and
advances in instrumentation and technique, which feature both invited
and contributed papers, and both platform and poster presentations.
Contributed sessions are featured in a comprehensive topical listing.
Characterization and Performance of Advanced Coatings and Thin Films