14 results
High Integrity SiO2/Al2O3 Gate Stack for Normally-off GaN MOSFET
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1561 / 2013
- Published online by Cambridge University Press:
- 27 June 2013, mrss13-1561-cc02-08
- Print publication:
- 2013
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Novel End-point Detection Method by Monitoring Shear Force Oscillation Frequency for Barrier Metal Polishing in Advanced LSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E13-03
- Print publication:
- 2009
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Optimizing Pad Groove Design and Polishing Kinematics for Reduced Shear Force, Low Force Fluctuation and Optimum Removal Rate Attributes of Copper CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E01-01
- Print publication:
- 2009
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High Performance Bottom Gate μc-Si TFT Fabricated by Microwave Plasma CVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1066 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1066-A13-04
- Print publication:
- 2008
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Low-Temperature Formation of SiO2 and High Dielectrics Constant Material for ULSI in 21st Century
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- Journal:
- MRS Online Proceedings Library Archive / Volume 567 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 3
- Print publication:
- 1999
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The Effect of contamination solutions and substrate conditions on Copper Particle Growth Behavior
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- Journal:
- MRS Online Proceedings Library Archive / Volume 477 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 275
- Print publication:
- 1997
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Native Oxide Growth Behavior on Silicon Surface with Various Resistivity in Ultrapure Water and CuF2 Solution
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- Journal:
- MRS Online Proceedings Library Archive / Volume 477 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 427
- Print publication:
- 1997
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Depth Profile Of Point Defects In Ion Implanted n+p and p+n Junctions Formed By 450°C Post-Implantation Annealing And Impact Of Defects On Junction Characteristics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 442 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 163
- Print publication:
- 1996
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Improvement Of Pecvd-SiNx For Tft Gate Insulator By Controlling Ion Bomberdment Energy
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- Journal:
- MRS Online Proceedings Library Archive / Volume 415 / 1995
- Published online by Cambridge University Press:
- 10 February 2011, 57
- Print publication:
- 1995
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Recent Advances in Wet Processing Technology and Science
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- Journal:
- MRS Online Proceedings Library Archive / Volume 386 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 3
- Print publication:
- 1995
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The Adhesion and the Protection of Metallic Impurities at the Interface of Si Wafer Surface with Anion Species
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- Journal:
- MRS Online Proceedings Library Archive / Volume 315 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 333
- Print publication:
- 1993
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Metal Removal by Wafer Spin Cleaning Process with Advanced Chemical Distribution System
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- Journal:
- MRS Online Proceedings Library Archive / Volume 315 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 313
- Print publication:
- 1993
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Texture Analysis of Si(100) and Si(111) Surfaces Using Autocovariance Of Afm Images
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- Journal:
- MRS Online Proceedings Library Archive / Volume 315 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 417
- Print publication:
- 1993
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In Situ Control of Native Oxide Growth for Semiconductor Processes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 259 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 19
- Print publication:
- 1992
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