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Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D3.8.1
- Print publication:
- 2000
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Integration Challenges of Inorganic Low-K (K≤2.5) Materials with CU for Sub-0.25μm Multilevel Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 151
- Print publication:
- 1999
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Integration Challenges of Inorganic Low-K (K≤2.5) Materials with Cu for Sub-0.25µm Multilevel Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 564 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 499
- Print publication:
- 1999
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Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica
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- Journal:
- MRS Online Proceedings Library Archive / Volume 579 / 1999
- Published online by Cambridge University Press:
- 15 February 2011, 255
- Print publication:
- 1999
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Integration of Multi-Level Copper Metallization into a High Performance Sub-0.25μM Technology
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 41
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- 1998
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Integration Of BPDA-PDA Polyimide With Two Levels Of Al(Cu) Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 217
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- 1995
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