2 results
Chemical influence of inert gas on the thin film stress in plasma-enhanced chemical vapor deposited a-SiN: H films
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- Journal:
- Journal of Materials Research / Volume 11 / Issue 2 / February 1996
- Published online by Cambridge University Press:
- 31 January 2011, pp. 391-398
- Print publication:
- February 1996
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Plasma Etching and Surface Analysis of a-SiC:H Films Deposited by Low Temperature Plasma Enhanced Chemical Vapor Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 334 / 1993
- Published online by Cambridge University Press:
- 22 February 2011, 445
- Print publication:
- 1993
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