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The Effects of Plasma Induced Damage on The Channel Layers of Ion Implanted GaAs MESFETs during Reactive Ion Etching(RIE) and Plasma Ashing Processes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 720 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, H3.4
- Print publication:
- 2002
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- Article
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