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In-situ Measurements of Cluster Volume Fraction in Silicon Thin Films Using Quartz Crystal Microbalances

Published online by Cambridge University Press:  18 May 2012

Yeonwon Kim ,
Kosuke Hatozaki ,
Yuji Hashimoto ,
Hyunwoong Seo ,
Giichiro Uchida ,
Kunihiro Kamataki ,
Naho Itagaki ,
Kazunori Koga  and
Masaharu Shiratani
Yeonwon Kim
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Kosuke Hatozaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Yuji Hashimoto
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Hyunwoong Seo
Affiliation:
Center of Plasma Nano-interface Engineering Graduate School of Information Science and Electrical Engineering, Kyushu University.
Giichiro Uchida
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Kunihiro Kamataki
Affiliation:
Center for Research and Advancement in Higher Education, Kyushu University
Naho Itagaki
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Kazunori Koga
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
Masaharu Shiratani
Affiliation:
Graduate School of Information Science and Electrical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan.
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Abstract

We have carried out in-situ measurements of cluster volume fraction in silicon films during deposition by using quartz crystal microbalances (QCM’s) together with a cluster-eliminating filter. The cluster volume fraction in films is deduced from in-situ measurements of film deposition rates with and without silicon clusters using QCM’s. The results show that the higher deposition rate leads to the higher volume fraction of clusters.

Keywords

amorphousplasma-enhanced CVD (PECVD) (deposition)Si
Type
Articles
Information
MRS Online Proceedings Library (OPL) , Volume 1426: Symposium A – Amorphous and Polycrystalline Thin-Film Silicon Science and Technology–2012 , 2012 , pp. 307 - 311
Copyright
Copyright © Materials Research Society 2012

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References

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