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Electron Beam Sources using InGaN Semiconductor Photocathodes for Single-shot Imaging Electron Microscope

Published online by Cambridge University Press:  04 August 2017

Tomohiro Nishitani
Affiliation:
Institute for Advanced Research, Nagoya University, Nagoya, Japan Synchrotron Radiation Research center, Nagoya University, Nagoya, Japan
Akihiro Narita
Affiliation:
Graduate School of Sciences, The Structural Biology Research Center and Division of Biological Science, Nagoya University, Nagoya, Japan
Takeshi Tomita
Affiliation:
JEOL Ltd., Tokyo, Japan
Shin-ichi Kitamura
Affiliation:
JEOL Ltd., Tokyo, Japan
Takashi Meguro
Affiliation:
Department of Physics, Faculty of Science Division II, Tokyo University of Science, Tokyo, Japan
Hokuto Iijima
Affiliation:
Department of Physics, Faculty of Science Division II, Tokyo University of Science, Tokyo, Japan
Shingo Fuchi
Affiliation:
College of Science and Engineering, Aoyama Gakuin University, Sagamihara-shi, Japan
Masao Tabuchi
Affiliation:
Synchrotron Radiation Research center, Nagoya University, Nagoya, Japan
Yoshio Honda
Affiliation:
Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya, Japan
Hiroshi Amano
Affiliation:
Institute of Materials and Systems for Sustainability, Nagoya University, Nagoya, Japan

Abstract

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Type
Abstract
Copyright
© Microscopy Society of America 2017 

References

[1] Nishitani, T., et al., J. Appl. Phys. 97, 094907 2005.Google Scholar
[2] Neil, G. R., et al., Phys. Rev. Lett. 84, 662 2000.CrossRefGoogle Scholar
[3] Orlov, D.A., et al., Nucl. Instrum. Methods A 532, 418 2004.Google Scholar
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[6] Nishitani, T., et al., J. Vac. Sci. B 32, 06F901 2014.Google Scholar
[7] The authors acknowledge funding from SENTAN, JST, Japan.Google Scholar