We report on the investigation of GaN(0001)−1×1 using synchrotron radiation x-ray excited photoelectron spectra from the core levels Ga 3p and N 1s, as well as from the contaminants O 1s and C 1s. Measurements were done after outgassing (a) and during three surface treatment methods performed in sequence; (b) ammonia (NH3) flux anneals, (c) Ga deposition with sample held at room temperature followed by vacuum anneal, and (d) Ga deposition on a heated sample followed by Ga desorption during NH3 flux anneal. We have found that the initial NH3 flux anneals increased the amount of present N on the surface and enabled the formation of a well-ordered surface structure, according to the low energy electron diffraction (LEED) pattern. After treatment (b) and (d) the core level spectra of Ga 3p are much improved showing clearly distinct features indicative of increased Ga-N bonding. The Ga to N concentration ratio decreases during the surface treatments from 4.0 to 1.1, hence towards stoichiometry. The amounts of C (and O) present on the surface after outgassing corresponded to 1.1 (0.9) monolayers (ML) but reduced to 0.1 (0.1) ML after the final treatment (d). The Fermi level position in the band gap shifts down by 0.55 eV during the surface treatments, indicating a change of states present in the band gap. We have also found strong support that this Ga-polar sample is initially Ga-terminated.

We propose the use of a buffer sublayer made of materials with crystal structure of cubic syngony to eliminate 30° in-plane rotation of (0001) heteroepitaxial wurtzite type AIIIBV nitride films with respect to the (0001) or (110) working surface of the sapphire substrate. In these cases, the lattice parameter mismatch between the sapphire substrate surface and the semiconductor film is much smaller, and the cleavage planes of the sapphire and the semiconductor films with wurtzite structure forming the active region of a heterolaser are parallel. It is shown experimentally that using, for instance, Nb on (0001) Al2O3 or NbN on (110) Al2O3, allows the elimination of the 30° in-plane rotation of the (0001)AlN film with respect to the (0001) or (110) working surface of the sapphire substrate.

GaN undoped layers of good morphology, good crystallinity and electrical properties were grown on c-plane sapphire substrates by the atmospheric pressure MOVPE technique using a new multi-buffer growth approach. A suitable buffer layer growth technique was worked out which enabled growth of GaN layers with properties superior to those grown in a conventional process scheme. Additional buffer layers, deposited with increasing temperature and increasing V/III molar ratio, were inserted between the low temperature buffer layer and the high temperature GaN layer grown on it. The c and a lattice constants of the high temperature GaN overgrown layer were evaluated from X-ray data. The layer mosaicity and c-lattice parameter variation were determined. The relationship between c and a lattice parameters and the second buffer layer growth scheme has been studied. The effect of second buffer layer growth conditions, buffer layer annealing time as well as the influence of V/III molar ratio during the high temperature GaN deposition on the crystalline and electrical properties of overgrown GaN epitaxial layers are presented. Characterization includes surface morphology examination by SEM and Nomarski optical microscope, X-ray diffraction and C-V measurements.