The integration of dissimilar materials is highly desirable for many different types of device applications but often challenging to achieve in practice. The unrivalled imaging capabilities of the aberration-corrected electron microscope enable enhanced insights to be gained into the atomic arrangements across heterostructured interfaces. This paper provides an overview of our recent observations of oxide-semiconductor heterostructures using aberration-corrected high-angle annular-dark-field and large-angle bright-field imaging modes. The perovskite oxides studied include strontium titanate, barium titanate, and strontium hafnate, which were grown on Si(001) and/or Ge(001) substrates using the techniques of molecular-beam epitaxy or atomic-layer deposition. The oxide layers displayed excellent crystallinity and sharp, abrupt interfaces were observed with no sign of any amorphous interfacial layers. The Ge(001) substrate surfaces invariably showed both 1× and 2× periodicity consistent with preservation of the 2 × 1 surface reconstruction following oxide growth. Overall, the results augur well for the future development of functional oxide-based devices integrated on semiconductor substrates.

Synthesis of Pb(Zr1–xTix)O3 (PZT) on a single substrate using a high-throughput molecular-beam epitaxy technique was demonstrated. In situ synthesis of crystalline PZT at elevated substrate temperatures could not be achieved, as reevaporation of Pb (PbO) occurred and the partial pressure of O2 was insufficient to prevent formation of a PbPtx phase during deposition. Instead, ex situ postdeposition annealing was performed on PZT deposited at room temperature. Dense single phase PZT was prepared with a compositional range of 0.1 > x > 0.9, for film thicknesses up to 800 nm. Transmission electron microscopy revealed the grain size increased from 50 nm to ∼0.5 μm with increasing Zr-concentration and became more columnar. Raman, x-ray diffraction, and scanning electron microscopy/energy dispersive spectroscopy results revealed a morphotropic phase boundary between rhombohedral and tetragonal phases occurred at x ∼0.4 rather than at x = 0.47 in bulk ceramics. This was attributed to clamping arising from mismatch in thermal expansion between the film and substrate.

High-quality doped GaN layers were grown on silicon substrates by radio frequency nitrogen plasma-assisted molecular-beam epitaxy. High-temperature-grown AlN (about 200 nm) was used as a buffer layer. In-growth doping was done using high-purity Si and Mg as n- and p-type dopants, respectively. X-ray diffraction revealed that monocrystalline GaN was obtained. This is in good agreement with the results of morphological study by atomic force microscopy. Micro-photoluminescence (PL) and micro-Raman spectroscopy were used to study the room-temperature optical properties of the doping films. No yellow-band emission was observed in the PL spectroscopy. From the Hall measurements, the resulting n-type doping concentration was measured to be (1–2) × 1019 cm−3. Fairly uniform hole concentration as high as (4–5) × 1020 cm−3 throughout the GaN crystal was achieved. In terms of the carrier concentration, it was found that the results determined from the Fourier transform infrared analysis are in good agreement with the results determined from the Hall measurements.

GaP–GaAsP segmented nanowires (NWs), with diameters ranging between 20 and 500 nm and lengths between 0.5 and 2 μm, were catalytically grown from Au particles on a GaAs (111)B substrate in a gas source molecular beam epitaxy system. The morphology of the NWs was either pencil-shaped with a tapered tip or rod-shaped with a constant diameter along the entire length. Stacking faults were observed for most NWs with diameters greater than 30 nm, but thinner ones tended to exhibit fewer defects. Moreover, stacking faults were more likely found in GaAsP than in GaP. The composition of the pencil NWs exhibited a core–shell structure at the interface region, and rod-shaped NWs resulted in planar and atomically abrupt heterointerfaces. A detailed growth mechanism is presented based on a layer-by-layer growth mode for the rod-shaped NWs and a step-flow growth mode for the tapered region of the pencil NWs.

New candidate ferromagnetic semiconductors have recently been grown by doping semiconducting transition-metal oxides with magnetic impurities. Some of these exhibit ferromagnetism at and above room temperature. The critical question is why? In many cases, complex solid-state chemistry is involved in the synthesis and drives the resulting properties. The observation of room-temperature ferromagnetism in these materials must be accompanied by a careful identification of the phases and structures present in order to accurately identify the origin of the magnetism.

Ferromagnetic materials that have Curie temperatures above room temperature, crystal structures and lattice matching compatible with compound semiconductors, and high spin polarizations show great promise for integration with semiconductor spintronics. Heusler alloys have crystal structures (fcc) and lattice parameters similar to many compound semiconductors, high spin polarization at the Fermi level, and high Curie temperatures. These properties make them particularly attractive for injectors and detectors of spin-polarized currents. This review discusses the progress and issues related to integrating full and half Heusler alloys into ferromagnetic compound semiconductor heterostructures.

We describe how the material properties of III–V semiconductors, including bandgap, band structure, band offset, refractive index, absorption, and ionization coefficient, are exploited for lasers and photodetectors for fiber-optic communications. The material systems discussed for 1.3 μm and 1.55 μm light emission include the more traditional GaInAsP and AlGaInAs on InP, the more recently investigated GaInAs quantum dots and low-bandgap GaInNAs on GaAs as well as GaAsSb/GaAs Type II structures, and the potentially viable GaN/AlGaN from intersubband transitions (i.e., between quantized conduction-band energy levels). As an example of photodetector applications, GaInAsP/InP and wafer-fused GaInAs/Si are discussed in terms of gain and noise factor for use in avalanche photodiodes with separate absorption and multiplication regions.

GaAs-based continuous-wave quantum-dot vertical-cavity surface-emitting lasers (VCSELs) operating at 1.3 μm at 20°C with output power of 1.2 mW have been realized. Threshold currents approach 1–1.5 mA for 8-μm oxide apertures. Operating voltages are ∼2 V. Long operation lifetimes in excess of 5000 h at 50°C without degradation have been achieved. This article describes these breakthroughs, which are based on our development of complex self-organized growth technologies for defect-free stacked quantum dots.

Optical components based on vertical-cavity surface-emitting lasers (VCSELs) are moving from 850-nm wavelengths to 1.31-μm and 1.55-μm wavelengths. These long-wavelength devices, enabled by new developments in materials technology, will compete directly with distributed-feedback (DFB) and Fabry-Pérot (FP) laser technologies in fiber-optic markets. In addition, the unique properties of VCSELs are opening up a new category of optically integrated components that are not possible with traditional edge-emitting laser source technologies. These VCSEL structures, such as linear and two-dimensional arrays, have the potential to dramatically reduce the cost structure of traditional optical networking equipment and provide a path for rapid growth in optical bandwidth.