The design and construction of a double-hexapole aberration corrector
has made it possible to build the prototype of a spherical-aberration
corrected transmission electron microscope dedicated to high-resolution
imaging on the atomic scale. The corrected instrument, a Philips CM200 FEG
ST, has an information limit of better than 0.13 nm, and the spherical
aberration can be varied within wide limits, even to negative values. The
aberration measurement and the corrector control provide instrument
alignments stable enough for materials science investigations. Analysis of
the contrast transfer with the possibility of tunable spherical aberration
has revealed new imaging modes: high-resolution amplitude contrast,
extension of the point resolution to the information limit, and enhanced
image intensity modulation for negative phase contrast. In particular,
through the combination of small negative spherical aberration and small
overfocus, the latter mode provides the high-resolution imaging of weakly
scattering atom columns, such as oxygen, in the vicinity of strongly
scattering atom columns. This article reviews further lens aberration
theory, the principle of aberration correction through multipole lenses,
aspects for practical work, and materials science applications.