2 results
The effects of using axial magnetic field in extreme ultraviolet photon sources for nanolithography – recent integrated simulation
-
- Journal:
- Laser and Particle Beams / Volume 34 / Issue 1 / March 2016
- Published online by Cambridge University Press:
- 07 January 2016, pp. 163-170
-
- Article
- Export citation
Hollow laser self-confined plasma for extreme ultraviolet lithography and other applications
-
- Journal:
- Laser and Particle Beams / Volume 25 / Issue 1 / March 2007
- Published online by Cambridge University Press:
- 28 February 2007, pp. 143-154
-
- Article
- Export citation