We developed a comprehensive model for simulating laser/target interaction in the presence of external axial magnetic fields. The model was integrated into the framework of the HEIGHTS-LPP computer simulation package and benchmarked with recent experimental results. The package was then used to study the angular distribution of extreme ultraviolet (EUV) photon output in plasmas produced in tin planar targets by a Nd:YAG laser. A moderate (0.5 T) permanent magnetic field does not affect EUV source evolution and output. More effective control of plasma plume expansion should be based on magnetic field gradients, that is, on the temporary varying magnetic fields as a magnetic pinch. Analysis of angular EUV output showed strong anisotropy of photon emissions. We found that the correct monitoring angle (i.e., at which the measured EUV flux corresponds to the averaged value after the correctly integrated angular distribution) does not depend on laser irradiance in the studied range and is equivalent to ~60°. We recommend arranging the EUV sensors accordingly in experiments with planar tin targets.

Laser-produced plasma (LPP) devices are being developed as a light source for the extreme ultraviolet (EUV) lithography applications. One concern of such devices is to increase the conversion efficiency of laser energy to EUV light. A new idea based on the initiation and confinement of cumulative plasma jet inside a hollow laser beam is developed and simulated. The integrated computer model (HEIGHTS) was used to simulate the plasma behavior and the EUV radiation output in the LPP devices. The model takes into account plasma heat conduction and magnetohydrodynamic processes in a two-temperature approximation, as well as detailed photon radiation transport in 3D Monte Carlo model. The model employs cylindrical 2D version of a total variation-diminishing scheme (for the plasma hydrodynamics) and an implicit scheme with the sparse matrix linear solver (to describe heat conduction). Numerical simulations showed that the EUV efficiency of the proposed hollow-beam LPP device to be higher than the current standard devices.