6 results
Extending the Use of NO Dielectrics for DRAM by Ultrathin Silicon Nitride RTCVD with In Situ Ammonia and Hydrogen Pre-Deposition Surface Conditioning
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- Journal:
- MRS Online Proceedings Library Archive / Volume 470 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 387
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- 1997
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Effects of A.C. Stress on Charge and Voltage Decay Rates of PZT Thin Film Capacitors for DRAM Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 361 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 263
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- 1994
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Effects of Electron Beam Irradiation on PZT/PLZT Thin Film Capacitors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 361 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 85
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- 1994
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Effect of Microstructure on the Electrical Characteristics of Sol-Gel Derived PZT Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 361 / 1994
- Published online by Cambridge University Press:
- 15 February 2011, 409
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- 1994
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Ultra-Thin Sputtered Pzt Films for Ulsi Drams
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- Journal:
- MRS Online Proceedings Library Archive / Volume 310 / 1993
- Published online by Cambridge University Press:
- 21 February 2011, 473
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- 1993
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The Impact of Device Asymmetry on the Electrical and Reliability Properties of Ferroelectric PZT for Memory Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 265 / 1992
- Published online by Cambridge University Press:
- 15 February 2011, 313
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- 1992
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