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Impact of Interfacial Nitridation of HfO2 High-k Gate Dielectric Stack on 4H-SiC
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- Journal:
- MRS Online Proceedings Library Archive / Volume 996 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0996-H07-08
- Print publication:
- 2007
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- Article
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