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High-density microwave plasma of SiH4/H2 for high rate growth of highly crystallized microcrystalline silicon films
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- Journal:
- The European Physical Journal - Applied Physics / Volume 33 / Issue 3 / March 2006
- Published online by Cambridge University Press:
- 22 February 2006, pp. 153-159
- Print publication:
- March 2006
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- Article
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