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Aluminum Chemical Vapor Deposition Using Triisobutylaluminum: Mechanism, Kinetics, and Deposition Rates at Steady State
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- Journal:
- MRS Online Proceedings Library Archive / Volume 131 / 1988
- Published online by Cambridge University Press:
- 25 February 2011, 327
- Print publication:
- 1988
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- Article
- Export citation