4 results
Amorphization/templated Recrystallization (ATR) Method for Hybrid Orientation Substrates
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 913 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0913-D01-01
- Print publication:
- 2006
-
- Article
- Export citation
Electrical Activation of Boron in B+ + C+ Implanted Si during RTA with Different Heating Rates
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 357
- Print publication:
- 1994
-
- Article
- Export citation
Heating Rate Effects in Rapid Thermal Annealing of Arsenic Implanted Silicon
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 342 / 1994
- Published online by Cambridge University Press:
- 22 February 2011, 351
- Print publication:
- 1994
-
- Article
- Export citation
Electrical Activation Behavior of Ion Implanted Silicon in Gallium Arsenide During Rapid Thermal Annealing
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 144 / 1988
- Published online by Cambridge University Press:
- 26 February 2011, 495
- Print publication:
- 1988
-
- Article
- Export citation