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Interface Effects on the Adhesion of Thin Aluminum Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 472 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 155
- Print publication:
- 1997
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- Article
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Safe Precursor Gas for Broad Replacement of SiH4 in Plasma Processes Employed in Integrated Circuit Production
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- Journal:
- MRS Online Proceedings Library Archive / Volume 447 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 145
- Print publication:
- 1996
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- Article
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