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Effect of Low Power Deposition and Low Oxidation Temperature on the Interfacial and Structural Properties of sputtered HfO2 Gate Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1394 / 2012
- Published online by Cambridge University Press:
- 25 April 2012, mrsf11-1394-m04-10
- Print publication:
- 2012
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- Article
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