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Shallow Junction Formation in Silicon: Dopant Incorporation and Diffusion Through Tungsten Silicide Films Using Gas Immersion Laser Doping (Gild)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 673
- Print publication:
- 1992
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- Article
- Export citation